| 12283499 |
Method and/or system for coating a substrate |
Gary Hillman, Rajnish Tiwari |
2025-04-22 |
| 11532494 |
System for coating a substrate |
Gary Hillman, Rajnish Tiwari |
2022-12-20 |
| 6803319 |
Process for optically erasing charge buildup during fabrication of an integrated circuit |
Alan C. Janos, Anthony Sinnot, Ivan L. Berry, III, Kevin Alexander STEWART |
2004-10-12 |
| 6709807 |
Process for reducing edge roughness in patterned photoresist |
John Scott Hallock |
2004-03-23 |
| 6605484 |
Process for optically erasing charge buildup during fabrication of an integrated circuit |
Alan C. Janos, Anthony Sinnot, Ivan L. Berry, III, Kevin Alexander STEWART |
2003-08-12 |
| 6582891 |
Process for reducing edge roughness in patterned photoresist |
John Scott Hallock |
2003-06-24 |
| 6503693 |
UV assisted chemical modification of photoresist |
John Scott Hallock |
2003-01-07 |
| 6417115 |
Treatment of dielectric materials |
Terrence Alair McDevitt |
2002-07-09 |
| 6406836 |
Method of stripping photoresist using re-coating material |
Qingyuan Han, Ivan L. Berry, III, Mahmoud Dahimene, Stuart Rounds |
2002-06-18 |
| 6214524 |
Controlled amine poisoning for reduced shrinkage of features formed in photoresist |
— |
2001-04-10 |
| 6117622 |
Controlled shrinkage of photoresist |
Jeffrey Eisele |
2000-09-12 |
| 6057084 |
Controlled amine poisoning for reduced shrinkage of features formed in photoresist |
— |
2000-05-02 |
| 5094884 |
Method and apparatus for applying a layer of a fluid material on a semiconductor wafer |
Gary Hillman |
1992-03-10 |