Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6734120 | Method of photoresist ash residue removal | Ivan L. Berry, III, Stuart Rounds, Michael W. Owens, Mahmoud Dahimene | 2004-05-11 |
| 6709807 | Process for reducing edge roughness in patterned photoresist | Robert Douglas Mohondro | 2004-03-23 |
| 6582891 | Process for reducing edge roughness in patterned photoresist | Robert Douglas Mohondro | 2003-06-24 |
| 6524936 | Process for removal of photoresist after post ion implantation | Alan F. Becknell, Palani Sakthivel | 2003-02-25 |
| 6503693 | UV assisted chemical modification of photoresist | Robert Douglas Mohondro | 2003-01-07 |
| 6387461 | Oxygen scavenger compositions | Cynthia L. Ebner | 2002-05-14 |
| 6258883 | Oxygen scavenging system and compositions | Cynthia L. Ebner | 2001-07-10 |
| 6172147 | Additive for production of highly workable mortar cement | Angel Abelleira | 2001-01-09 |
| 6007885 | Oxygen scavenging compositions and methods for making same | — | 1999-12-28 |
| 5981147 | Stable, ionomeric photoresist emulsion and process of preparation and use thereof | Alan F. Becknell, Cynthia L. Ebner, Daniel J. Hart | 1999-11-09 |
| 5941037 | Oxygen scavenging hydrotalcite and compositions containing same | Drew V. Speer | 1999-08-24 |
| 5925719 | Photoresist developable in aqueous base made from acid-functional .beta.-hydroxy thiol resin | Donald Herr | 1999-07-20 |
| 5919602 | Photocurable composition based on acid functional primary resinous mercaptans | Donald Herr | 1999-07-06 |
| 5869220 | Waterborne photoresist emulsions and methods of preparation thereof | Hiroshi Samukawa | 1999-02-09 |
| 5782972 | Additive for production of highly workable mortar cement | Angel Abelleira | 1998-07-21 |
| 5508141 | Autodeposition emulsion and methods of using thereof to selectively protect metallic surfaces | Daniel J. Hart, Alan F. Becknell, Betsy Elzufon, Alan R. Browne | 1996-04-16 |
| 5496682 | Three dimensional sintered inorganic structures using photopolymerization | Tariq Quadir, Srinivas Krishnaswamy Mirle | 1996-03-05 |