| 7821655 |
In-situ absolute measurement process and apparatus for film thickness, film removal rate, and removal endpoint prediction |
Montien Saubhayana |
2010-10-26 |
| 7709814 |
Apparatus and process for treating dielectric materials |
Carlo Waldfried, Christopher Garmer, Orlando Escorcia, Ivan L. Berry, III, Palani Sakthivel |
2010-05-04 |
| 7166963 |
Electrodeless lamp for emitting ultraviolet and/or vacuum ultraviolet radiation |
Malcolm Pack, Mohammad Kamarchi, Michael B. Colson |
2007-01-23 |
| 6987269 |
Apparatus and process for measuring light intensities |
Betty Zhang |
2006-01-17 |
| 6897615 |
Plasma process and apparatus |
David Ferris, Ivan L. Berry, III, Michael G. Ury |
2005-05-24 |
| 6803319 |
Process for optically erasing charge buildup during fabrication of an integrated circuit |
Anthony Sinnot, Ivan L. Berry, III, Kevin Alexander STEWART, Robert Douglas Mohondro |
2004-10-12 |
| 6664737 |
Dielectric barrier discharge apparatus and process for treating a substrate |
Ivan L. Berry, III, Michael B. Colson |
2003-12-16 |
| 6605484 |
Process for optically erasing charge buildup during fabrication of an integrated circuit |
Anthony Sinnot, Ivan L. Berry, III, Kevin Alexander STEWART, Robert Douglas Mohondro |
2003-08-12 |
| 6597003 |
Tunable radiation source providing a VUV wavelength planar illumination pattern for processing semiconductor wafers |
Daniel Richardson |
2003-07-22 |
| 6585908 |
Shallow angle interference process and apparatus for determining real-time etching rate |
Andre Cardoso |
2003-07-01 |
| 6547458 |
Optimized optical system design for endpoint detection |
Andre Cardoso, Daniel Richardson |
2003-04-15 |
| 5980638 |
Double window exhaust arrangement for wafer plasma processor |
— |
1999-11-09 |
| 4713208 |
Spheromak reactor with poloidal flux-amplifying transformer |
Harold P. Furth, Tadao Uyama, Masaaki Yamada |
1987-12-15 |
| 4687617 |
Steady-state inductive spheromak operation |
Stephen C. Jardin, Masaaki Yamada |
1987-08-18 |