Issued Patents All Time
Showing 26–38 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6828078 | Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern | Isao Nishimura, Nobuo Bessho, Atsushi Kumano, Kenji Yamada | 2004-12-07 |
| 6824954 | Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same | Eiji Yoneda, Tatsuya Toneri, Yong Wang | 2004-11-30 |
| 6821705 | Radiation-sensitive resin composition | Tomoki Nagai, Jun Numata, Eiichi Kobayashi | 2004-11-23 |
| 6800414 | Radiation-sensitive resin composition | Yukio Nishimura, Noboru Yamahara, Masafumi Yamamoto, Toru Kajita, Hiroshi Ito | 2004-10-05 |
| 6770780 | Vinylphenylpropionic acid derivatives, production process therefor, polymer thereof and radiation sensitive resin composition | Yong Wang, Yasuaki Mutsuga, Shigeo Shimizu, Atsushi Kumano | 2004-08-03 |
| 6753124 | Radiation-sensitive resin composition | Yukio Nishimura, Katsuji Douki, Toru Kajita | 2004-06-22 |
| 6623907 | Radiation-sensitive resin composition | Jun Numata, Aki Suzuki, Hiromichi Hara, Norihiro Natsume, Kiyoshi Murata +3 more | 2003-09-23 |
| 6531260 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition | Haruo Iwasawa, Akihiro Hayashi, Satoru Nishiyama | 2003-03-11 |
| 6517992 | N-sulfonyloxyimide compound and radiation-sensitive resin composition using the same | Yong Wang, Eiichi Kobayashi, Masaaki Miyaji, Jun Numata | 2003-02-11 |
| 6482568 | Radiation-sensitive resin composition | Katsuji Douki, Kiyoshi Murata, Hiroyuki Ishii, Toru Kajita | 2002-11-19 |
| 6299785 | Electrode formation process | Hideaki Masuko, Hiroaki Nemoto, Nobuo Bessho | 2001-10-09 |
| 5432039 | Radiation sensitive quinone diazide and resin composition for microlens | Atsufumi Shimada, Masayuki Endo, Nobuo Bessho | 1995-07-11 |
| 5110706 | I-line radiation-sensitive alkali-soluble resin composition utilizing 1,2-quinone diazide compound and hydroxy-chalcone additive | Yoshiji Yumoto, Takao Miura | 1992-05-05 |