Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11815253 | Light source device, cooling method, and manufacturing method for product | Kazuyuki Kasumi | 2023-11-14 |
| 9446473 | Electric resistance welding operation management device, electric resistance welding operation management method, and computer program | Noboru Hasegawa, Toshisuke Fukami, Nobuo Mizuhashi, Hideki Hamatani, Yoshifumi Karube +2 more | 2016-09-20 |
| 9416882 | Split valve | — | 2016-08-16 |
| 9327908 | Conveying apparatus | — | 2016-05-03 |
| 9199291 | Operation management device, operation management method, and operation management program for high-frequency resistance welding and induction welding | Noboru Hasegawa, Hideki Hamatani, Kunihiko Hatabara, Nobuo Mizuhashi, Kazuto Yamamoto | 2015-12-01 |
| 5753406 | Radiation-sensitive resin composition | Satoshi Miyashita, Akihiro Yamanouchi, Ikuo Nozue | 1998-05-19 |
| 5705425 | Process for manufacturing semiconductor devices separated by an air-bridge | Tunenori Yamauchi, Yoshinobu Monma, Hiroshi Goto | 1998-01-06 |
| 5609988 | Radiation sensitive resin composition | Hidetoshi Miyamoto, Shinji Shiraki, Yoshiji Yumoto | 1997-03-11 |
| 5594724 | Transmission convergence sublayer multiplex generating/terminating apparatus | Masao Akata, Takeshi Ogawa, Yukihiro Doi, Isao Higashi, Hitoshi Imagawa | 1997-01-14 |
| 5580695 | Chemically amplified resist | Makoto Murata, Yoshiji Yumoto, Toshiyuki Ota, Eiichi Kobayashi | 1996-12-03 |
| 5525457 | Reflection preventing film and process for forming resist pattern using the same | Hiroaki Nemoto, Masayuki Endo, Yoshiji Yumoto | 1996-06-11 |
| 5494777 | Radiation sensitive resin composition | Shinji Shiraki, Hidetoshi Miyamoto, Masaaki Inoue, Toshiyuki Ota, Yoshiji Yumoto | 1996-02-27 |
| 5482063 | Tank cleaning device | Isao Miura | 1996-01-09 |
| 5482816 | Radiation-sensitive composition | Makoto Murata, Mikio Yamachika, Yoshiji Yumoto | 1996-01-09 |
| 5478691 | Radiation-sensitive resin composition | Satoshi Miyashita, Akihiro Yamanouchi, Ikuo Nozue | 1995-12-26 |
| 5413896 | I-ray sensitive positive resist composition | Toru Kajita, Toshiyuki Ota, Yoshiji Yumoto | 1995-05-09 |
| 5410005 | Reflection preventing film and process for forming resist pattern using the same | Hiroaki Nemoto, Takayoshi Tanabe, Yoshiji Yumoto | 1995-04-25 |
| 5376498 | Negative type radiation-sensitive resin composition | Toru Kajita, Eiichi Kobayashi, Toshiyuki Ota | 1994-12-27 |
| 5332650 | Radiation-sensitive composition | Makoto Murata, Mikio Yamachika, Yoshiji Yumoto | 1994-07-26 |
| 5250836 | Semiconductor device having silicon-on-insulator structure | Kazunori Imaoka | 1993-10-05 |
| 5238775 | Radiation-sensitive resin composition | Toru Kajita, Yoshiji Yumoto, Chozo Okuda | 1993-08-24 |
| 5233218 | Semiconductor wafer and process for producing same | — | 1993-08-03 |
| 5231045 | Method of producing semiconductor-on-insulator structure by besol process with charged insulating layers | Kazunori Imaoka | 1993-07-27 |
| 5148247 | Semiconductor device having trench isolation | Kazunori Imaoka | 1992-09-15 |
| 5110706 | I-line radiation-sensitive alkali-soluble resin composition utilizing 1,2-quinone diazide compound and hydroxy-chalcone additive | Yoshiji Yumoto, Tsutomu Shimokawa | 1992-05-05 |