YY

Yoshiji Yumoto

JR Japan Synthetic Rubber: 12 patents #10 of 558Top 2%
JS Jsr: 1 patents #649 of 1,137Top 60%
Overall (All Time): #357,235 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
6048659 Radiation-sensitive resin composition Masaaki Inoue, Katsumi Inomata, Hiromichi Hara 2000-04-11
5958645 Radiation-sensitive resin composition Kouichi Hirose, Masahiro Akiyama, Katsumi Inomata 1999-09-28
5893861 Surgical knife for cutting out tendon sheath 1999-04-13
5609988 Radiation sensitive resin composition Hidetoshi Miyamoto, Shinji Shiraki, Takao Miura 1997-03-11
5580695 Chemically amplified resist Makoto Murata, Takao Miura, Toshiyuki Ota, Eiichi Kobayashi 1996-12-03
5525457 Reflection preventing film and process for forming resist pattern using the same Hiroaki Nemoto, Masayuki Endo, Takao Miura 1996-06-11
5494777 Radiation sensitive resin composition Shinji Shiraki, Hidetoshi Miyamoto, Masaaki Inoue, Toshiyuki Ota, Takao Miura 1996-02-27
5482816 Radiation-sensitive composition Makoto Murata, Mikio Yamachika, Takao Miura 1996-01-09
5413896 I-ray sensitive positive resist composition Toru Kajita, Toshiyuki Ota, Takao Miura 1995-05-09
5410005 Reflection preventing film and process for forming resist pattern using the same Hiroaki Nemoto, Takayoshi Tanabe, Takao Miura 1995-04-25
5332650 Radiation-sensitive composition Makoto Murata, Mikio Yamachika, Takao Miura 1994-07-26
5238775 Radiation-sensitive resin composition Toru Kajita, Takao Miura, Chozo Okuda 1993-08-24
5110706 I-line radiation-sensitive alkali-soluble resin composition utilizing 1,2-quinone diazide compound and hydroxy-chalcone additive Tsutomu Shimokawa, Takao Miura 1992-05-05
4626556 Solvent-soluble organopolysilsesquioxane, process for producing the same, and semi-conductor using the same Ikuo Nozue, Osahiko Tomomitsu, Yoshio Matsumura 1986-12-02