Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6270939 | Radiation-sensitive resin composition | Yoshihiro Hosaka, Masashige Takatori, Yoshiyuki Harita | 2001-08-07 |
| 6228554 | Radiation-sensitive resin composition | Yoshihiro Hosaka, Masashige Takatori, Yoshiyuki Harita | 2001-05-08 |
| 6020104 | Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent | Yoshihiro Hosaka, Masashige Takatori, Yoshiyuki Harita | 2000-02-01 |
| 5925492 | Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent | Yoshihiro Hosaka, Masashige Takatori, Yoshiyuki Harita | 1999-07-20 |
| 5753406 | Radiation-sensitive resin composition | Satoshi Miyashita, Akihiro Yamanouchi, Takao Miura | 1998-05-19 |
| 5494784 | Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent | Yoshihiro Hosaka, Masashige Takatori, Yoshiyuki Harita | 1996-02-27 |
| 5478691 | Radiation-sensitive resin composition | Satoshi Miyashita, Akihiro Yamanouchi, Takao Miura | 1995-12-26 |
| 5405720 | Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent | Yoshihiro Hosaka, Masashige Takatori, Yoshiyuki Harita | 1995-04-11 |
| 5238774 | Radiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent | Yoshihiro Hosaka, Masashige Takatori, Yoshiyuki Harita | 1993-08-24 |
| 5215857 | 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent | Yoshihiro Hosaka, Masashige Takatori, Yoshiyuki Harita | 1993-06-01 |
| 5087548 | Positive type radiation-sensitive resin composition | Yoshihiro Hosaka, Masashige Takatori, Yoshiyuki Harita, Kiyoshi Honda | 1992-02-11 |
| 4626556 | Solvent-soluble organopolysilsesquioxane, process for producing the same, and semi-conductor using the same | Osahiko Tomomitsu, Yoshiji Yumoto, Yoshio Matsumura | 1986-12-02 |
| 4399266 | Laddery lower alkylpolysilsesquioxane having heat-resistant thin film-formability and process for preparing same | Yoshio Matsumura, Osahiko Tomomitsu, Takashi Ukachi, Taro Suminoe | 1983-08-16 |
| 4349664 | Doped acetylene polymer and process for production thereof | Yoshio Matsumura, Takashi Ukachi | 1982-09-14 |