Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6270939 | Radiation-sensitive resin composition | Yoshihiro Hosaka, Ikuo Nozue, Masashige Takatori | 2001-08-07 |
| 6228554 | Radiation-sensitive resin composition | Yoshihiro Hosaka, Ikuo Nozue, Masashige Takatori | 2001-05-08 |
| 6020104 | Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent | Yoshihiro Hosaka, Ikuo Nozue, Masashige Takatori | 2000-02-01 |
| 5925492 | Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent | Yoshihiro Hosaka, Ikuo Nozue, Masashige Takatori | 1999-07-20 |
| 5494784 | Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent | Yoshihiro Hosaka, Ikuo Nozue, Masashige Takatori | 1996-02-27 |
| 5405720 | Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent | Yoshihiro Hosaka, Ikuo Nozue, Masashige Takatori | 1995-04-11 |
| 5238774 | Radiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent | Yoshihiro Hosaka, Ikuo Nozue, Masashige Takatori | 1993-08-24 |
| 5215857 | 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent | Yoshihiro Hosaka, Ikuo Nozue, Masashige Takatori | 1993-06-01 |
| 5087548 | Positive type radiation-sensitive resin composition | Yoshihiro Hosaka, Ikuo Nozue, Masashige Takatori, Kiyoshi Honda | 1992-02-11 |
| 4963463 | Radiation-sensitive resin composition with admixtures of O-quinone diazide and acid esters having nitrobenzyl or cyanobenzyl group | Mitsunobu Koshiba, Keiichi Yamada, Bruno Roland, Jan Vandendriesshe | 1990-10-16 |
| 4957588 | Method for high temperature reaction process | Mitsunobu Koshiba, Yuuji Furuto, Bruno Roland, Ria Lombaerts | 1990-09-18 |
| 4886565 | Reactive ion etching apparatus | Mitsunobu Koshiba, Keiichi Yamada, Shin'ichi Kawamura, Yuuji Furuto | 1989-12-12 |
| 4623609 | Process for forming patterns using ionizing radiation sensitive resist | Yoichi Kamoshida, Masashige Takatori, Kunihiro Harada | 1986-11-18 |
| 4499171 | Positive type photosensitive resin composition with at least two o-quinone diazides | Yoshihiro Hosaka, Yoichi Kamoshida, Kunihiro Harada | 1985-02-12 |
| 4407927 | Photoresist composition | Yoichi Kamoshida, Toshiaki Yoshihara, Kunihiro Harada | 1983-10-04 |
| 4384037 | Positive type photosensitive resin composition | Yoshihiro Hosaka, Yoichi Kamoshida, Kunihiro Harada | 1983-05-17 |
| 4349619 | Photoresist composition | Yoichi Kamoshida, Toshiaki Yoshihara, Kunihiro Harada | 1982-09-14 |
| 4330612 | Laminate of monolayer film of cyclized butadiene polymer and other photosensitive layer | Mituru Tashiro, Kunihiro Harada | 1982-05-18 |
| 4294908 | Photoresist composition containing modified cyclized diene polymers | Yoichi Kamoshida, Kunihiro Harada | 1981-10-13 |
| 4275142 | Photosensitive compositions and printing plates containing same | Yoshihiro Hosaka, Mitsuo Kurokawa, Kunihiro Harada, Eijiro Tagami | 1981-06-23 |