Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9644339 | Damper operation control device and damper operation control method for working vehicle | Minoru Wada | 2017-05-09 |
| 9037358 | Wheel loader | Nobuo Matsuyama | 2015-05-19 |
| 8538640 | Travel damper control device for wheel loader | — | 2013-09-17 |
| 6727032 | Radiation-sensitive resin composition | Mitsuhito Suwa, Toru Kajita, Shin-ichiro Iwanaga | 2004-04-27 |
| 6692887 | Radiation-sensitive resin composition | Mitsuhito Suwa, Toru Kajita, Shin-ichiro Iwanaga | 2004-02-17 |
| RE37179 | Radiation sensitive resin composition | Mikio Yamachika, Eiichi Kobayashi, Akira Tsuji | 2001-05-15 |
| 6114086 | Chemically amplified resist composition | Eiichi Kobayashi, Makoto Murata, Akira Tsuji | 2000-09-05 |
| 6048666 | Radiation sensitive resin composition | Kazuaki Niwa, Masako Suzuki, Hozumi Sato, Hideki Chiba | 2000-04-11 |
| 6040117 | Negative photoresist stripping liquid composition | Kimiyasu Sano, Hideaki Tashiro, Hozumi Sato | 2000-03-21 |
| 6035911 | Pneumatic tire including fluorine based oligomer | Hiroyuki Matsumoto, Hideki Matsui, Kenji Matsuo | 2000-03-14 |
| 5965328 | Radiation sensitive resin composition and material for forming bumps containing the same | Kimiyasu Sano, Hideki Chiba, Katsutoshi Igarashi, Yoshiyuki Michino, Hozumi Sato | 1999-10-12 |
| 5942369 | Positive photoresist composition | Kimiyasu Sano, Masaru Ohta, Hozumi Sato | 1999-08-24 |
| 5916729 | Chemically amplified resist composition | Eiichi Kobayashi, Makoto Murata, Akira Tsuji | 1999-06-29 |
| 5798201 | Radiation sensitive resin composition | Katsumi Inomata, Nasahiro Akiyama, Akira Tsuji | 1998-08-25 |
| 5707558 | Radiation sensitive resin composition | Katsumi Inomata, Nasahiro Akiyama, Akira Tsuji | 1998-01-13 |
| 5679495 | Radiation sensitive resin composition | Mikio Yamachika, Eiichi Kobayashi, Akira Tsuji | 1997-10-21 |
| 5672459 | Radiation sensitive resin composition containing quinone diazide ester having two hindered phenol groups | Katsumi Inomata, Masahiro Akiyama, Akira Tsuji | 1997-09-30 |
| 5629135 | Chemically amplified resist composition | Eiichi Kobayashi, Makoto Murata, Akira Tsuji | 1997-05-13 |
| 5580695 | Chemically amplified resist | Makoto Murata, Takao Miura, Yoshiji Yumoto, Eiichi Kobayashi | 1996-12-03 |
| 5556734 | Radiation sensitive resin composition comprising copolymer of isopropenylphenol and T-butyl(meth)acrylate | Mikio Yamachika, Eiichi Kobayashi, Akira Tsuji | 1996-09-17 |
| 5494777 | Radiation sensitive resin composition | Shinji Shiraki, Hidetoshi Miyamoto, Masaaki Inoue, Yoshiji Yumoto, Takao Miura | 1996-02-27 |
| 5413896 | I-ray sensitive positive resist composition | Toru Kajita, Yoshiji Yumoto, Takao Miura | 1995-05-09 |
| 5376498 | Negative type radiation-sensitive resin composition | Toru Kajita, Eiichi Kobayashi, Takao Miura | 1994-12-27 |