Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10086583 | Stack, method for treating substrate material, temporary fixing composition, and semiconductor device | Torahiko YAMAGUCHI, Hiroyuki Ishii | 2018-10-02 |
| 8889557 | Substrate treating method, temporary fixing composition and semiconductor device | Torahiko YAMAGUCHI, Seiichirou TAKAHASHI, Hiroyuki Ishii | 2014-11-18 |
| 7371500 | Positive photosensitive insulating resin composition and cured product thereof | Takashi Nishioka, Atsushi Itou, Masayoshi Suzuki, Shin-ichirou Iwanaga | 2008-05-13 |
| 7265044 | Method for forming bump on electrode pad with use of double-layered film | Masaru Ohta, Shinichiro Iwanaga | 2007-09-04 |
| 7247420 | Two-layer film and method of forming pattern with the same | Masaru Ohta, Atsushi Ito, Isamu Mochizuki, Shin-ichiro Iwanaga | 2007-07-24 |
| 7214454 | Positively photosensitive insulating resin composition and cured object obtained therefrom | Takashi Nishioka, Atsushi Itou, Masayoshi Suzuki, Shin-ichirou Iwanaga | 2007-05-08 |
| 7015256 | Composition for forming photosensitive dielectric material, and transfer film, dielectric material and electronic parts using the same | Nobuyuki Ito, Hideaki Masuko, Satomi Hasegawa, Atsushi Ito | 2006-03-21 |
| 6171750 | Radiation-sensitive resin composition | Katsuji Douki, Tooru Mizumachi, Shin-ichiro Iwanaga | 2001-01-09 |
| 6048659 | Radiation-sensitive resin composition | Masaaki Inoue, Hiromichi Hara, Yoshiji Yumoto | 2000-04-11 |
| 6007961 | Radiation-sensitive resin composition | Masahiro Akiyama, Shin-ichiro Iwanaga, Akira Tsuji | 1999-12-28 |
| 5958645 | Radiation-sensitive resin composition | Kouichi Hirose, Masahiro Akiyama, Yoshiji Yumoto | 1999-09-28 |
| 5798201 | Radiation sensitive resin composition | Nasahiro Akiyama, Toshiyuki Ota, Akira Tsuji | 1998-08-25 |
| 5707558 | Radiation sensitive resin composition | Nasahiro Akiyama, Toshiyuki Ota, Akira Tsuji | 1998-01-13 |
| 5672459 | Radiation sensitive resin composition containing quinone diazide ester having two hindered phenol groups | Masahiro Akiyama, Toshiyuki Ota, Akira Tsuji | 1997-09-30 |