Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6040117 | Negative photoresist stripping liquid composition | Toshiyuki Ota, Hideaki Tashiro, Hozumi Sato | 2000-03-21 |
| 5965328 | Radiation sensitive resin composition and material for forming bumps containing the same | Hideki Chiba, Katsutoshi Igarashi, Toshiyuki Ota, Yoshiyuki Michino, Hozumi Sato | 1999-10-12 |
| 5942369 | Positive photoresist composition | Toshiyuki Ota, Masaru Ohta, Hozumi Sato | 1999-08-24 |
| 5530036 | Epoxy group-containing copolymer and radiation sensitive resin compositions thereof | Masayuki Endo, Atsufumi Shimada, Yasuaki Yokoyama, Nobuo Bessho | 1996-06-25 |
| 5399604 | Epoxy group-containing resin compositions | Masayuki Endo, Atsufumi Shimada, Yasuaki Yokoyama, Nobuo Bessho | 1995-03-21 |
| 5362597 | Radiation-sensitive resin composition comprising an epoxy-containing alkali-soluble resin and a naphthoquinone diazide sulfonic acid ester | Osahiko Tomomitsu, Masayuki Endoh, Yasuaki Yokoyama | 1994-11-08 |