Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12372869 | Method for forming resist pattern and radiation-sensitive resin composition | Kazuki Kasahara, Katsuaki NISHIKORI, Sosuke Osawa, Miki Tamada | 2025-07-29 |
| 12332563 | Pattern-forming method and composition | Hiroyuki Komatsu | 2025-06-17 |
| 12065534 | Composition, method of producing substrate, and polymer | Hiroyuki Komatsu, Tatsuya Sakai | 2024-08-20 |
| 11796912 | Radiation-sensitive composition and pattern-forming method | — | 2023-10-24 |
| 11745216 | Method for producing film | Ryo KUMEGAWA, Sosuke Osawa, Miki Tamada, Ken MARUYAMA | 2023-09-05 |
| 11603480 | Composition for underlayer film formation, underlayer film for directed self-assembled film and forming method thereof, and directed self-assembly lithography process | Hiroyuki Komatsu, Miki Tamada | 2023-03-14 |
| 11319388 | Radiation-sensitive resin composition, production method thereof, and resist pattern-forming method | Ken MARUYAMA, Yoshiki Nonoyama, Takuo Sone | 2022-05-03 |
| 11270883 | Pattern-forming method and composition | Hiroyuki Komatsu | 2022-03-08 |
| 11204552 | Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent | Tomoki Nagai, Takehiko Naruoka, Ken MARUYAMA, Hisashi Nakagawa | 2021-12-21 |
| 10725376 | Pattern-forming method | Hisashi Nakagawa, Takehiko Naruoka | 2020-07-28 |
| 10520815 | Pattern-forming method | Takehiko Naruoka, Tomohisa Fujisawa, Hisashi Nakagawa | 2019-12-31 |