Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12009180 | Plasma processing apparatus | Kazuya Yamada | 2024-06-11 |
| 11978612 | Plasma processing apparatus | Isao Mori, Masaru Izawa, Naoki Yasui, Kazuya Yamada | 2024-05-07 |
| 11424105 | Plasma processing apparatus | Isao Mori, Masaru Izawa, Naoki Yasui, Kazuya Yamada | 2022-08-23 |
| 11355315 | Plasma processing apparatus and plasma processing method | Naoki Yasui | 2022-06-07 |
| 11152192 | Plasma processing apparatus and method | Naoki Yasui, Tooru Aramaki, Yasuhiro Nishimori | 2021-10-19 |
| 11094512 | Plasma processing apparatus and plasma processing method | Kazuya Yamada, Koichi Yamamoto, Naoki Yasui, Isao Mori | 2021-08-17 |
| 11081320 | Plasma processing apparatus, plasma processing method, and ECR height monitor | Naoki Yasui, Kazuya Yamada | 2021-08-03 |
| 10755897 | Plasma processing apparatus and plasma processing method | Kazuya Yamada, Naoki Yasui | 2020-08-25 |
| 10699884 | Plasma processing apparatus and plasma processing method | Kazuya Yamada, Koichi Yamamoto, Naoki Yasui, Isao Mori | 2020-06-30 |
| 10088750 | Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method | Hayato Namai | 2018-10-02 |
| 9720322 | Photoresist composition, compound, and production method thereof | Hayato Namai, Takanori Kawakami | 2017-08-01 |
| 9588423 | Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method | Hayato Namai | 2017-03-07 |
| 9477149 | Photoresist composition, compound, and production method thereof | Hayato Namai, Takanori Kawakami | 2016-10-25 |
| 9459532 | Radiation-sensitive resin composition, polymer and compound | Shin Nakamura | 2016-10-04 |
| 9390941 | Sample processing apparatus, sample processing system, and method for processing sample | Seiichi Watanabe, Yutaka Kozuma, Tooru Aramaki, Naoki Yasui, Hiroaki Takikawa | 2016-07-12 |
| 9329474 | Photoresist composition and resist pattern-forming method | Kazuki Kasahara | 2016-05-03 |
| 9323146 | Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable base | Hayato Namai, Kazuo Nakahara | 2016-04-26 |
| 8182977 | Polymer and positive-tone radiation-sensitive resin composition | Hiromitsu Nakashima, Saki Harada | 2012-05-22 |
| 8157877 | Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and kit for preparing chemical mechanical polishing aqueous dispersion | Tomikazu Ueno | 2012-04-17 |
| 7550020 | Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method | Kazuo Nishimoto, Masayuki Hattori, Nobuo Kawahashi | 2009-06-23 |
| 7252782 | Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method | Kazuo Nishimoto, Masayuki Hattori, Nobuo Kawahashi | 2007-08-07 |
| 7189651 | Stopper for chemical mechanical planarization, method for manufacturing same, and chemical mechanical planarization method | Mutsuhiko Yoshioka, Eiji Hayashi | 2007-03-13 |