Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6966821 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Hiromi Yajima, Seiji Ishikawa, Manabu Tsujimura | 2005-11-22 |
| 6547638 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Hiromi Yajima, Seiji Ishikawa, Manabu Tsujimura | 2003-04-15 |
| 6443808 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Hiromi Yajima, Seiji Ishikawa, Manabu Tsujimura | 2002-09-03 |
| 6439971 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Hiromi Yajima, Seiji Ishikawa, Manabu Tsujimura | 2002-08-27 |
| 6425806 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Hiromi Yajima, Seiji Ishikawa, Manabu Tsujimura | 2002-07-30 |
| 6273802 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Hiromi Yajima, Seiji Ishikawa, Manabu Tsujimura | 2001-08-14 |
| 5948205 | Polishing apparatus and method for planarizing layer on a semiconductor wafer | Masako Kodera, Hiroyuki Yano, Atsushi Shigeta, Hiromi Yajima, Haruo Okano | 1999-09-07 |
| 5914275 | Polishing apparatus and method for planarizing layer on a semiconductor wafer | Masako Kodera, Hiroyuki Yano, Atsushi Shigeta, Hiromi Yajima, Haruo Okano | 1999-06-22 |
| 5885138 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device | Katsuya Okumura, Hiromi Yajima, Seiji Ishikawa, Manabu Tsujimura | 1999-03-23 |
| 5695601 | Method for planarizing a semiconductor body by CMP method and an apparatus for manufacturing a semiconductor device using the method | Masako Kodera, Atsushi Shigeta, Shiro Mishima, Hiromi Yajima | 1997-12-09 |
| 5653623 | Polishing apparatus with improved exhaust | Norio Kimura, Seiji Ishikawa, Masako Kodera, Atsushi Shigeta | 1997-08-05 |
| 5641581 | Semiconductor device | Yukio Nishiyama, Rempei Nakata, Nobuo Hayasaka, Haruo Okano, Takahito Nagamatsu +3 more | 1997-06-24 |
| 5616063 | Polishing apparatus | Katsuya Okumura, Hiromi Yajima, Masako Kodera, Shirou Mishima, Atsushi Shigeta +3 more | 1997-04-01 |
| 5597341 | Semiconductor planarizing apparatus | Masako Kodera, Hiroyuki Yano, Atsushi Shigeta, Hiromi Yajima, Haruo Okano | 1997-01-28 |
| 5571578 | Method for forming silicon oxide on a semiconductor | Naruhiko Kaji, Hiroyuki Toyama, Hidemitsu Egawa, Takamitsu Yoshida, Yukio Nishiyama | 1996-11-05 |
| 5445996 | Method for planarizing a semiconductor device having a amorphous layer | Masako Kodera, Hiroyuki Yano, Atsushi Shigeta, Hiromi Yajima, Haruo Okano | 1995-08-29 |
| 5429995 | Method of manufacturing silicon oxide film containing fluorine | Yukio Nishiyama, Rempei Nakata, Nobuo Hayasaka, Haruo Okano, Takahito Nagamatsu +3 more | 1995-07-04 |
| 5398459 | Method and apparatus for polishing a workpiece | Katsuya Okumura, Tohru Watanabe, Hiroyuki Yano, Masako Kodera, Atsushi Shigeta +4 more | 1995-03-21 |
| 5068709 | Semiconductor device having a backplate electrode | Hidemitsu Egawa, Katsuya Okumura | 1991-11-26 |
| 4937652 | Semiconductor device and method of manufacturing the same | Katsuya Okumura, Toshinori Shinki, Toshiaki Idaka | 1990-06-26 |
| 4875088 | Semiconductor device having a backplate electrode | Hidemitsu Egawa, Katsuya Okumura | 1989-10-17 |