Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11742179 | Proximity effect correcting method, master plate manufacturing method, and drawing apparatus | Yoshinori Kagawa | 2023-08-29 |
| 8282868 | Semiconductor device fabrication method and pattern formation mold | Ikuo Yoneda | 2012-10-09 |
| 8206895 | Method for forming pattern and method for manufacturing semiconductor device | Ikuo Yoneda | 2012-06-26 |
| 7985958 | Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program | Tetsuro Nakasugi, Kazuo Tawarayama, Hiroyuki Mizuno, Takumi Ota, Noriaki Sasaki +2 more | 2011-07-26 |
| 7854604 | Semiconductor device fabrication method and pattern formation mold | Ikuo Yoneda | 2010-12-21 |
| 7368736 | Charged beam exposure apparatus and method for manufacturing mask and semiconductor device | — | 2008-05-06 |
| 7102147 | Charged particle beam exposure method and method for producing charged particle beam exposure data | Ryoichi Inanami, Atsushi Ando | 2006-09-05 |
| 7079994 | Method and system for producing semiconductor devices | Ryoichi Inanami, Katsuya Okumura | 2006-07-18 |
| 6835942 | Method for correcting a proximity effect, an exposure method, a manufacturing method of a semiconductor device and a proximity correction module | Shinji Sato | 2004-12-28 |
| 6718532 | Charged particle beam exposure system using aperture mask in semiconductor manufacture | Ryoichi Inanami, Atsushi Ando | 2004-04-06 |
| 6675368 | Apparatus for and method of preparing pattern data of electronic part | Mariko Takayanagi, Tatsuya Ohguro | 2004-01-06 |
| 6560768 | Circuit pattern design method, circuit pattern design system, and recording medium | Ryoichi Inanami, Shouhei Kousai | 2003-05-06 |
| 6543044 | Method of extracting characters and computer-readable recording medium | Ryoichi Inanami | 2003-04-01 |
| 6495841 | Charged beam drawing apparatus | Atsushi Ando, Kazuyoshi Sugihara, Yuichiro Yamazaki, Motosuke Miyoshi, Katsuya Okumura +1 more | 2002-12-17 |
| 6481004 | Circuit pattern design method, exposure method, charged-particle beam exposure system | Ryoichi Inanami | 2002-11-12 |
| 6316163 | Pattern forming method | Masamitsu Itoh, Shinji Sato, Soichi Inoue, Kazuyoshi Sugihara, Katsuya Okumura | 2001-11-13 |
| 6204511 | Electron beam image picturing method and image picturing device | Masamitsu Itoh, Shinji Sato | 2001-03-20 |
| 6093931 | Pattern-forming method and lithographic system | Kazuyoshi Sugihara, Hiromi Niiyama, Atsushi Ando, Tetsuro Nakasugi, Shinji Sato +4 more | 2000-07-25 |
| 6020107 | Pattern forming method through combined electron beam and light exposure utilizing multiple heat steps | Hiromi Niiyama, Shinji Sato | 2000-02-01 |
| 5994030 | Pattern-forming method and lithographic system | Kazuyoshi Sugihara, Hiromi Niiyama, Atsushi Ando, Tetsuro Nakasugi, Shinji Sato +4 more | 1999-11-30 |