Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9885960 | Pattern shape adjustment method, pattern shape adjustment system, exposure apparatus, and recording medium | Nobuhiro Komine, Kazuya Fukuhara | 2018-02-06 |
| 9772566 | Mask alignment mark, photomask, exposure apparatus, exposure method, and manufacturing method of device | Nobuhiro Komine | 2017-09-26 |
| 8067757 | Extreme ultraviolet light source apparatus and method of adjusting the same | — | 2011-11-29 |
| 8023759 | Focus monitoring method | — | 2011-09-20 |
| 7985958 | Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program | Tetsuro Nakasugi, Hiroyuki Mizuno, Takumi Ota, Noriaki Sasaki, Tatsuhiko Higashiki +2 more | 2011-07-26 |
| 6558852 | Exposure method, reticle, and method of manufacturing semiconductor device | Takuya Kouno | 2003-05-06 |