Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9922991 | Semiconductor memory device and method for manufacturing same | Tetsuya Kamigaki, Isahiro Hasegawa, Shinichi Ito, Soichi Inoue, Kei Hattori +2 more | 2018-03-20 |
| 9894271 | Pattern inspection apparatus and pattern inspection method | Ryoji Yoshikawa, Seiji Morita, Takashi Hirano | 2018-02-13 |
| 8609014 | Template manufacturing method, semiconductor device manufacturing method and template | Tsukasa Azuma, Kyoichi Suguro | 2013-12-17 |
| 8174669 | Liquid immersion optical tool, method for cleaning liquid immersion optical tool, liquid immersion exposure method and method for manufacturing semiconductor device | Hiroshi Tomita | 2012-05-08 |
| 8122385 | Mask pattern correcting method | Kazuya Fukuhara, Toshiya Kotani, Satoshi Tanaka, Takashi Sato, Akiko Mimotogi +1 more | 2012-02-21 |
| 7985958 | Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program | Tetsuro Nakasugi, Kazuo Tawarayama, Hiroyuki Mizuno, Takumi Ota, Noriaki Sasaki +2 more | 2011-07-26 |
| 7968272 | Semiconductor device manufacturing method to form resist pattern | Daisuke Kawamura, Eishi Shiobara, Tomoyuki Takeishi, Kei Hayasaki, Yasunobu Onishi +1 more | 2011-06-28 |
| 7952071 | Apparatus and method for inspecting sample surface | Nobuharu Noji, Yoshihiko Naito, Hirosi Sobukawa, Masahiro Hatakeyama, Kenji Terao +2 more | 2011-05-31 |
| 7630052 | Exposure processing system, exposure processing method and method for manufacturing a semiconductor device | Takuya Kono, Nobuhiro Komine, Shoichi Harakawa, Makato Ikeda | 2009-12-08 |
| 7546178 | Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device | Takuya Kouno, Shigeki Nojima | 2009-06-09 |
| 7269470 | Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device | Takuya Kouno, Shigeki Nojima | 2007-09-11 |
| 7139998 | Photomask designing method, pattern predicting method and computer program product | Kazuya Fukuhara, Soichi Inoue | 2006-11-21 |
| 7100146 | Design system of alignment marks for semiconductor manufacture | Takashi Sato, Takuya Kouno, Takashi Sakamoto, Yoshiyuki Shioyama, Ichiro Mori +1 more | 2006-08-29 |
| 7046334 | Displacement correction apparatus, exposure system, exposure method and a computer program product | Takuya Kono | 2006-05-16 |
| 7018932 | Method for manufacturing a semiconductor device and apparatus for manufacturing a semiconductor device | Shinichi Ito, Katsuya Okumura, Kenji Kawano, Soichi Inoue | 2006-03-28 |
| 6872508 | Exposure method and method of manufacturing semiconductor device | Nobuhiro Komine, Keita Asanuma | 2005-03-29 |
| 6842230 | Exposing method | Manabu Takakuwa, Keita Asanuma | 2005-01-11 |
| 6813001 | Exposure method and apparatus | Tadahito Fujisawa, Masafumi Asano | 2004-11-02 |
| 6730447 | Manufacturing system in electronic devices | Shinichi Ito, Hiroshi Ikegami, Nobuo Hayasaka | 2004-05-04 |
| 6479201 | Optical exposure apparatus of scanning exposure system and its exposing method | — | 2002-11-12 |
| 6437858 | Aberration measuring method, aberration measuring system and aberration measuring mask | Takuya Kouno, Hiroshi Nomura | 2002-08-20 |
| 6288556 | Method of electrical measurement of misregistration of patterns | Takashi Sato, Keita Asanuma, Junichiro Iba, Toru Ozaki, Hiroshi Nomura | 2001-09-11 |
| 6262792 | Optical exposure apparatus of scanning exposure system and its exposing method | — | 2001-07-17 |
| 6008880 | Exposure tool and method capable of correcting high (N-TH) order light exposure errors depending upon an interfield coordinate | Keita Asanuma | 1999-12-28 |