Issued Patents All Time
Showing 1–25 of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11796247 | Temperature control system | Akihiro Ito, Norio Kokubo, Masayuki Kouketsu, Toshiharu Nakazawa, Keisuke Takanashi +1 more | 2023-10-24 |
| 11788777 | Temperature control system and integrated temperature control system | Akihiro Ito, Norio Kokubo, Masayuki Kouketsu, Toshiharu Nakazawa, Keisuke Takanashi +1 more | 2023-10-17 |
| 11703284 | Temperature control system and integrated temperature control system | Akihiro Ito, Norio Kokubo, Masayuki Kouketsu, Toshiharu Nakazawa, Keisuke Takanashi +1 more | 2023-07-18 |
| 11656016 | Cooling system that comprises multiple cooling apparatus and reduces power consumption | Akihiro Ito, Norio Kokubo, Masayuki Kouketsu, Toshiharu Nakazawa, Keisuke Takanashi +1 more | 2023-05-23 |
| 9922991 | Semiconductor memory device and method for manufacturing same | Tetsuya Kamigaki, Shinichi Ito, Soichi Inoue, Tatsuhiko Higashiki, Kei Hattori +2 more | 2018-03-20 |
| 6261428 | Magnetron plasma process apparatus | Toshihisa Nozawa, Keiji Horioka | 2001-07-17 |
| 5888338 | Magnetron plasma processing apparatus and processing method | Hiromi Harada, Sinji Kubota, Hiromi Kumagai, Junichi Arami, Keiji Horioka +3 more | 1999-03-30 |
| 5698070 | Method of etching film formed on semiconductor wafer | Yoshihisa Hirano, Yoshifumi Tahara, Hiroshi Nishikawa, Keiji Horioka | 1997-12-16 |
| 5667622 | In-situ wafer temperature control apparatus for single wafer tools | Karl Paul Muller, Bernhard L. Poschenriedes, Hans-Joerg Timme, Theodore G. van Kessel | 1997-09-16 |
| 5660744 | Plasma generating apparatus and surface processing apparatus | Makoto Sekine, Keiji Horioka, Haruo Okano, Katsuya Okumura, Masaki Narita | 1997-08-26 |
| 5660671 | Magnetron plasma processing apparatus and processing method | Hiromi Harada, Sinji Kubota, Hiromi Kumagai, Junichi Arami, Keiji Horioka +3 more | 1997-08-26 |
| 5539179 | Electrostatic chuck having a multilayer structure for attracting an object | Toshihisa Nozawa, Junichi Arami, Shinji Kubota, Katsuya Okumura | 1996-07-23 |
| 5474643 | Plasma processing apparatus | Junichi Arami, Tamio Endo, Shiro Koyama, Kazuo Kikuchi, Teruaki Shiraishi +3 more | 1995-12-12 |
| 5444207 | Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field | Makoto Sekine, Keiji Horioka, Haruo Okano, Katsuya Okumura, Masaki Narita | 1995-08-22 |
| 5387893 | Permanent magnet magnetic circuit and magnetron plasma processing apparatus | Masami Oguriyama, Haruo Okano, Junichi Arami, Hiromi Harada | 1995-02-07 |
| 5376211 | Magnetron plasma processing apparatus and processing method | Hiromi Harada, Sinji Kubota, Hiromi Kumagai, Junichi Arami, Keiji Horioka +3 more | 1994-12-27 |
| 5356515 | Dry etching method | Yoshifumi Tahara, Yoshihisa Hirano, Masahiro Ogasawara, Keiji Horioka, Takaya Matsushita | 1994-10-18 |
| 5310454 | Dry etching method | Tokuhisa Ohiwa, Hisataka Hayashi, Keiji Horioka, Haruo Okano, Takaya Matsushita +1 more | 1994-05-10 |
| 5302236 | Method of etching object to be processed including oxide or nitride portion | Yoshifumi Tahara, Yoshihisa Hirano, Keiji Horioka | 1994-04-12 |
| 5290381 | Plasma etching apparatus | Toshihisa Nozawa, Junichi Arami, Keiji Horioka | 1994-03-01 |
| 5289152 | Permanent magnet magnetic circuit | Masami Oguriyama, Yoshio Ishigaki, Haruo Okano, Jun-ichi Arami, Hiromi Harada | 1994-02-22 |
| 5271788 | Plasma processing apparatus | Makoto Hasegawa, Takaya Matsushita, Keiji Horioka, Toshihisa Nozawa, Yoshio Ishikawa +2 more | 1993-12-21 |
| 5270266 | Method of adjusting the temperature of a semiconductor wafer | Yoshihisa Hirano, Yoshifumi Tahara, Keiji Horioka | 1993-12-14 |
| 5255153 | Electrostatic chuck and plasma apparatus equipped therewith | Toshihisa Nozawa, Junichi Arami, Katsuya Okumura | 1993-10-19 |
| 5236556 | Plasma apparatus | Takashi Yokota, Shiro Koyama, Haruo Okano | 1993-08-17 |