Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7209851 | Method and structure to develop a test program for semiconductor integrated circuits | Harsanjeet Singh, Ankan Pramanick, Mark Elston, Toshiaki Adachi | 2007-04-24 |
| 6423242 | Etching method | Masayuki Kojima, Masayuki Tomoyasu, Akira Koshiishi | 2002-07-23 |
| 6110287 | Plasma processing method and plasma processing apparatus | Izumi Arai, Hiroshi Nishikawa, Yoshinobu MITANO, Shunichi Iimuro, Kazuo Fukasawa +2 more | 2000-08-29 |
| 5858258 | Plasma processing method | Hiroshi Kojima, Izumi Arai | 1999-01-12 |
| 5705081 | Etching method | Koichiro Inazawa, Shin Okamoto | 1998-01-06 |
| 5698070 | Method of etching film formed on semiconductor wafer | Yoshihisa Hirano, Hiroshi Nishikawa, Isahiro Hasegawa, Keiji Horioka | 1997-12-16 |
| 5571366 | Plasma processing apparatus | Nobuo Ishii, Jiro Hata, Chishio Koshimizu, Hiroshi Nishikawa, Isei Imahashi | 1996-11-05 |
| 5494522 | Plasma process system and method | Shuji Moriya, Masahiro Ogasawara, Jun Yashiro, Satoru Kawakami, Susumu Tanaka | 1996-02-27 |
| 5449977 | Apparatus and method for generating plasma of uniform flux density | Satoshi Nakagawa, Masahiro Ogasawara | 1995-09-12 |
| 5411631 | Dry etching method | Masaru Hori, Haruo Okano, Michishige Aoyama, Masao Ito, Kei Hattori +1 more | 1995-05-02 |
| 5382311 | Stage having electrostatic chuck and plasma processing apparatus using same | Kenji Ishikawa, Mitsuaki Komino, Tadashi Mitui, Teruo Iwata, Izumi Arai | 1995-01-17 |
| 5356515 | Dry etching method | Yoshihisa Hirano, Masahiro Ogasawara, Isahiro Hasegawa, Keiji Horioka, Takaya Matsushita | 1994-10-18 |
| 5302236 | Method of etching object to be processed including oxide or nitride portion | Yoshihisa Hirano, Isahiro Hasegawa, Keiji Horioka | 1994-04-12 |
| 5270266 | Method of adjusting the temperature of a semiconductor wafer | Yoshihisa Hirano, Isahiro Hasegawa, Keiji Horioka | 1993-12-14 |
| 5203958 | Processing method and apparatus | Izumi Arai | 1993-04-20 |
| 5164034 | Apparatus and method for processing substrate | Izumi Arai, Yoshio Ishikawa | 1992-11-17 |
| 5155331 | Method for cooling a plasma electrode system for an etching apparatus | Takao Horiuchi, Izumi Arai | 1992-10-13 |
| 5089083 | Plasma etching method | Hiroshi Kojima, Izumi Arai | 1992-02-18 |
| 4978412 | Plasma processing device | Makoto Aoki, Izumi Arai | 1990-12-18 |
| 4963713 | Cooling of a plasma electrode system for an etching apparatus | Takao Horiuchi, Izumi Arai | 1990-10-16 |
| 4931135 | Etching method and etching apparatus | Takao Horiuchi, Izumi Arai | 1990-06-05 |