IA

Izumi Arai

TL Tokyo Electron Limited: 10 patents #748 of 5,567Top 15%
AB Asm Ip Holding B.V.: 5 patents #166 of 620Top 30%
Kyocera: 2 patents #1,365 of 3,732Top 40%
TL Tokyo Electron Yamanashi Limited: 2 patents #21 of 138Top 20%
SC Shin-Etsu Handotai Co.: 1 patents #385 of 679Top 60%
VJ Victor Company Of Japan: 1 patents #818 of 1,489Top 55%
MM Mitsubishi Motors: 1 patents #856 of 1,823Top 50%
RE Renesas Electronics: 1 patents #2,739 of 4,529Top 65%
SI Sanyo Chemical Industries: 1 patents #242 of 607Top 40%
📍 Nagaoka, JP: #8 of 243 inventorsTop 4%
Overall (All Time): #195,299 of 4,157,543Top 5%
22
Patents All Time

Issued Patents All Time

Showing 1–22 of 22 patents

Patent #TitleCo-InventorsDate
10679879 Substrate processing apparatus Soo Hyun Kim, Dae Youn Kim 2020-06-09
10403523 Substrate processing apparatus Soo Hyun Kim, Dae Youn Kim 2019-09-03
9753536 Electronic device Ryosuke Kobayashi 2017-09-05
9640416 Single-and dual-chamber module-attachable wafer-handling chamber 2017-05-02
9349620 Apparatus and method for pre-baking substrate upstream of process chamber Keisuke Kamata, Hiroyuki Sato, Kazunori Furukawahara, Masaei Suwada, Kenkichi Okubo 2016-05-24
9343350 Anti-slip end effector for transporting workpiece using van der waals force 2016-05-17
9340640 Polyol for polyurethane preparation and polyurethane preparation method using same Tomohisa Hirano, Koji Kabu 2016-05-17
8422214 Mobile electronic apparatus Koichiro Furumatsu, Takaaki Watanabe 2013-04-16
8115234 Semiconductor device Akishige Nakajima, Yasushi Shigeno, Hitoshi Akamine, Tsutomu Kobori, Kazuto Tajima +2 more 2012-02-14
8083856 Ultrasonic cleaning apparatus and ultrasonic cleaning method Tatsuo Abe, Hitoshi Kabasawa 2011-12-27
6330391 VTR signal processing circuit Takashi Kurihara, Yoshihisa Ichikawa, Naoki Kurabayashi, Hiroshi Kuramoto, Tsuyoshi Muroya 2001-12-11
6110287 Plasma processing method and plasma processing apparatus Yoshifumi Tahara, Hiroshi Nishikawa, Yoshinobu MITANO, Shunichi Iimuro, Kazuo Fukasawa +2 more 2000-08-29
5858258 Plasma processing method Hiroshi Kojima, Yoshifumi Tahara 1999-01-12
5382311 Stage having electrostatic chuck and plasma processing apparatus using same Kenji Ishikawa, Mitsuaki Komino, Tadashi Mitui, Teruo Iwata, Yoshifumi Tahara 1995-01-17
5203958 Processing method and apparatus Yoshifumi Tahara 1993-04-20
5164034 Apparatus and method for processing substrate Yoshifumi Tahara, Yoshio Ishikawa 1992-11-17
5155331 Method for cooling a plasma electrode system for an etching apparatus Takao Horiuchi, Yoshifumi Tahara 1992-10-13
5144800 Exhaust manifold system for a transverse v-type engine Yoshiaki Shioya, Toshiro Shimamoto, Susumu Kawamoto 1992-09-08
5089083 Plasma etching method Hiroshi Kojima, Yoshifumi Tahara 1992-02-18
4978412 Plasma processing device Makoto Aoki, Yoshifumi Tahara 1990-12-18
4963713 Cooling of a plasma electrode system for an etching apparatus Takao Horiuchi, Yoshifumi Tahara 1990-10-16
4931135 Etching method and etching apparatus Takao Horiuchi, Yoshifumi Tahara 1990-06-05