Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7337745 | Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptor | Hideaki Amano, Shosuke Endo, Toshiaki Fujisato, Yasuharu Sasaki | 2008-03-04 |
| 7033444 | Plasma processing apparatus, and electrode structure and table structure of processing apparatus | Yasuharu Sasaki, Kyo Tsuboi, Hideaki Amano | 2006-04-25 |
| 6634845 | Transfer module and cluster system for semiconductor manufacturing process | — | 2003-10-21 |
| 6544380 | Plasma treatment method and apparatus | Masayuki Tomoyasu, Akira Koshiishi, Kosuke Imafuku, Shosuke Endo, Kazuhiro Tahara +6 more | 2003-04-08 |
| 6431115 | Plasma treatment method and apparatus | Yoshio Sakamoto | 2002-08-13 |
| 6379756 | Plasma treatment method and apparatus | — | 2002-04-30 |
| 6264788 | Plasma treatment method and apparatus | Masayuki Tomoyasu, Akira Koshiishi, Kosuke Imafuku, Shosuke Endo, Kazuhiro Tahara +6 more | 2001-07-24 |
| 6167323 | Method and system for controlling gas system | Osamu Uchisawa, Yasuhiro Chiba | 2000-12-26 |
| 6156151 | Plasma processing apparatus | Junichi Arami, Koichi Yatsuda | 2000-12-05 |
| 6157774 | Vapor generating method and apparatus using same | Osamu Uchisawa | 2000-12-05 |
| 6134807 | Drying processing method and apparatus using same | Osamu Uchisawa | 2000-10-24 |
| 6131307 | Method and device for controlling pressure and flow rate | Osamu Uchisawa, Yasuhiro Chiba | 2000-10-17 |
| 6106737 | Plasma treatment method utilizing an amplitude-modulated high frequency power | Masayuki Tomoyasu, Akira Koshiishi, Kosuke Imafuku, Shosuke Endo, Kazuhiro Tahara +6 more | 2000-08-22 |
| 5769952 | Reduced pressure and normal pressure treatment apparatus | — | 1998-06-23 |
| 5753891 | Treatment apparatus | Teruo Iwata, Kenji Nebuka | 1998-05-19 |
| 5665166 | Plasma processing apparatus | Youichi Deguchi, Satoru Kawakami, Yoichi Ueda | 1997-09-09 |
| 5660740 | Treatment apparatus control method | — | 1997-08-26 |
| 5625526 | Electrostatic chuck | Masahide Watanabe, Masami Kubota, Shiro Koyama, Kenji Ishikawa, Kouichi Kazama +1 more | 1997-04-29 |
| 5584971 | Treatment apparatus control method | — | 1996-12-17 |
| 5581874 | Method of forming a bonding portion | Makoto Aoki, Masayuki Kitamura | 1996-12-10 |
| 5575853 | Vacuum exhaust system for processing apparatus | Junichi Arami, Masayuki Kitamura | 1996-11-19 |
| 5567267 | Method of controlling temperature of susceptor | Kouichi Kazama, Kenji Ishikawa, Yoichi Ueda | 1996-10-22 |
| 5478429 | Plasma process apparatus | Yoichi Ueda, Youichi Deguchi, Satoru Kawakami | 1995-12-26 |
| 5382311 | Stage having electrostatic chuck and plasma processing apparatus using same | Kenji Ishikawa, Tadashi Mitui, Teruo Iwata, Izumi Arai, Yoshifumi Tahara | 1995-01-17 |
| 5376213 | Plasma processing apparatus | Yoichi Ueda, Koichi Kazama | 1994-12-27 |