Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9399584 | Silicon focus ring | — | 2016-07-26 |
| 9290391 | Silicon component for plasma etching apparatus | — | 2016-03-22 |
| 8991214 | Method of refurbishing a quartz glass component | Katsutoshi Hoshino, Masahide KATO, Yasuhiro Umetsu | 2015-03-31 |
| 8785214 | Method of recycling silicon component for plasma etching apparatus and silicon component for plasma etching apparatus | — | 2014-07-22 |
| 7207340 | Method and system for removal of gas and plasma processing apparatus | Daisuke Hayashi | 2007-04-24 |
| 6723202 | Worktable device and plasma processing apparatus for semiconductor process | Toshifumi Nagaiwa, Shuei Sekizawa, Jun Ooyabu | 2004-04-20 |
| 6544380 | Plasma treatment method and apparatus | Masayuki Tomoyasu, Akira Koshiishi, Shosuke Endo, Kazuhiro Tahara, Yukio Naito +6 more | 2003-04-08 |
| 6391147 | Plasma treatment method and apparatus | Shosuke Endo, Kazuhiro Tahara, Yukio Naito, Kazuya Nagaseki, Keizo Hirose | 2002-05-21 |
| 6264788 | Plasma treatment method and apparatus | Masayuki Tomoyasu, Akira Koshiishi, Shosuke Endo, Kazuhiro Tahara, Yukio Naito +6 more | 2001-07-24 |
| 6106737 | Plasma treatment method utilizing an amplitude-modulated high frequency power | Masayuki Tomoyasu, Akira Koshiishi, Shosuke Endo, Kazuhiro Tahara, Yukio Naito +6 more | 2000-08-22 |
| 6074518 | Plasma processing apparatus | Shosuke Endo, Kazuhiro Tahara, Hiroshi Tsuchiya, Masayuki Tomoyasu, Yukio Naito +6 more | 2000-06-13 |
| D411516 | Gas diffusion plate for electrode of semiconductor wafer processing apparatus | Shosuke Endo, Kazuo Fukasawa | 1999-06-29 |
| 5716534 | Plasma processing method and plasma etching method | Hiroshi Tsuchiya, Yoshio Fukasawa, Shuji Mochizuki, Yukio Naito | 1998-02-10 |
| 5698062 | Plasma treatment apparatus and method | Takao Sakamoto, Kazuhiro Tahara, Kenji Momose, Shosuke Endo, Yukio Naito +2 more | 1997-12-16 |