JO

Jun Ooyabu

TL Tokyo Electron Limited: 12 patents #586 of 5,567Top 15%
📍 Yamanashi, JP: #321 of 1,957 inventorsTop 20%
Overall (All Time): #422,700 of 4,157,543Top 15%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
8512510 Plasma processing method and apparatus Akira Koshiishi, Jun Hirose, Masahiro Ogasawara, Taichi Hirano, Hiromitsu Sasaki +4 more 2013-08-20
8109288 Flow rate control system and shower plate used for partial pressure control system Hideki Nagaoka, Hiroshi Koizumi, Tsuyoshi Shimazu, Hiroki Endo, Keiki Ito +1 more 2012-02-07
7882800 Ring mechanism, and plasma processing device using the ring mechanism Akira Koshiishi, Mitsuru Hashimoto, Hideaki Tanaka, Shigeru Tahara, Kunihiko Hinata 2011-02-08
7658816 Focus ring and plasma processing apparatus Akira Koshiishi, Hideaki Tanaka, Nobuyuki Okayama, Masaaki Miyagawa, Shunsuke Mizukami +5 more 2010-02-09
7506610 Plasma processing apparatus and method Akira Koshiishi, Jun Hirose, Masahiro Ogasawara, Taichi Hirano, Hiromitsu Sasaki +4 more 2009-03-24
7494561 Plasma processing apparatus and method, and electrode plate for plasma processing apparatus Akira Koshiishi, Jun Hirose, Masahiro Ogasawara, Taichi Hirano, Hiromitsu Sasaki +4 more 2009-02-24
7481240 Partial pressure control system, flow rate control system and shower plate used for partial pressure control system Hideki Nagaoka, Hiroshi Koizumi, Tsuyoshi Shimazu, Hiroki Endo, Keiki Ito +1 more 2009-01-27
6723202 Worktable device and plasma processing apparatus for semiconductor process Toshifumi Nagaiwa, Shuei Sekizawa, Kosuke Imafuku 2004-04-20
6576860 Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate Chishio Koshimizu, Hideki Takeuchi, Akira Koshiishi 2003-06-10
6426477 Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate Chishio Koshimizu, Hideki Takeuchi, Akira Koshiishi 2002-07-30
6072147 Plasma processing system Akira Koshiishi 2000-06-06
D412513 Upper electrode for manufacturing semiconductors 1999-08-03