Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10074519 | Plasma processing apparatus and filter unit | Masaki Nishikawa, Naohiko Okunishi, Junichi Shimada, Ken Koyanagi | 2018-09-11 |
| 10056230 | Power supply system, plasma processing apparatus and power supply control method | Taichi Hirano, Junji Ishibashi, Kunihiro Sato | 2018-08-21 |
| 9441791 | Gas supply unit, substrate processing apparatus and supply gas setting method | Kenetsu Mizusawa, Masahide Itoh | 2016-09-13 |
| 8906193 | Gas supply unit, substrate processing apparatus and supply gas setting method | Kenetsu Mizusawa, Masahide Itoh | 2014-12-09 |
| 8109288 | Flow rate control system and shower plate used for partial pressure control system | Hideki Nagaoka, Hiroshi Koizumi, Jun Ooyabu, Tsuyoshi Shimazu, Hiroki Endo +1 more | 2012-02-07 |
| 7481240 | Partial pressure control system, flow rate control system and shower plate used for partial pressure control system | Hideki Nagaoka, Hiroshi Koizumi, Jun Ooyabu, Tsuyoshi Shimazu, Hiroki Endo +1 more | 2009-01-27 |
| 7353841 | Relative pressure control system and relative flow control system | Tetsujiro Kono, Hiroki Doi, Minoru Ito, Hideki Nagaoka, Hiroki Endo +5 more | 2008-04-08 |
| 5554249 | Magnetron plasma processing system | Makoto Hasegawa, Tsuyoshi Saito, Fumihiko Higuchi, Hideaki Amano, Katsunori Naitoh +3 more | 1996-09-10 |