Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8251011 | Plasma processing apparatus | Yohei Yamazawa, Manabu Iwata, Chishio Koshimizu, Akitaka Shimizu, Asao Yamashita +5 more | 2012-08-28 |
| 7527016 | Plasma processing apparatus | Yohei Yamazawa, Manabu Iwata, Chishio Koshimizu, Akitaka Shimizu, Asao Yamashita +5 more | 2009-05-05 |
| 7192532 | Dry etching method | Akiteru Koh, Toshihiro Miura, Takayuki Fukasawa, Akitaka Shimizu, Masato Kushibiki +1 more | 2007-03-20 |
| 5560804 | Etching method for silicon containing layer | Yoshio Fukasawa | 1996-10-01 |
| 5554249 | Magnetron plasma processing system | Makoto Hasegawa, Tsuyoshi Saito, Hideaki Amano, Katsunori Naitoh, Takashi Tozawa +3 more | 1996-09-10 |
| 5411631 | Dry etching method | Masaru Hori, Haruo Okano, Michishige Aoyama, Masao Ito, Kei Hattori +1 more | 1995-05-02 |
| 5314573 | Dry etching polysilicon using a bromine-containing gas | Yoshio Fukasawa | 1994-05-24 |