Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10176987 | SiC epitaxial wafer and method for manufacturing the same | Akira Miyasaka, Yutaka Tajima, Yoshiaki Kageshima, Daisuke Muto | 2019-01-08 |
| 9768047 | SiC epitaxial wafer and method for producing same, and device for producing SiC epitaxial wafer | Yoshiaki Kageshima, Daisuke Muto, Yoshihiko Miyasaka | 2017-09-19 |
| 9679767 | SiC epitaxial wafer and method for manufacturing the same | Akira Miyasaka, Yutaka Tajima, Yoshiaki Kageshima, Daisuke Muto | 2017-06-13 |
| 9624602 | Epitaxial wafer manufacturing device and manufacturing method | Yoshiaki Kageshima, Daisuke Muto | 2017-04-18 |
| 9607832 | Epitaxial wafer manufacturing device and manufacturing method | Yoshiaki Kageshima, Tomoyuki Noguchi, Daisuke Muto | 2017-03-28 |
| 9287121 | SIC epitaxial wafer and method for manufacturing same | Michiya Odawara, Daisuke Muto, Yoshiaki Kageshima | 2016-03-15 |
| 8823015 | Silicon carbide epitaxial wafer and manufacturing method therefor | Yutaka Tajima, Yasuyuki Sakaguchi, Michiya Odawara, Yoshihiko Miyasaka | 2014-09-02 |
| 8716718 | Epitaxial SiC single crystal substrate and method of manufacture of epitaxial SiC single crystal substrate | Michiya Odawara, Keiichi Matsuzawa, Hajime Okumura, Kazutoshi Kojima, Yuuki Ishida +2 more | 2014-05-06 |
| 8293623 | Epitaxial SiC single crystal substrate and method of manufacture of epitaxial SiC single crystal substrate | Michiya Odawara, Keiichi Matsuzawa, Hajime Okumura, Kazutoshi Kojima, Yuuki Ishida +2 more | 2012-10-23 |
| 5698062 | Plasma treatment apparatus and method | Takao Sakamoto, Kazuhiro Tahara, Kosuke Imafuku, Shosuke Endo, Yukio Naito +2 more | 1997-12-16 |
| 5246529 | Plasma processing method | Yoshio Fukasawa | 1993-09-21 |