SM

Shuji Moriya

TL Tokyo Electron Limited: 24 patents #199 of 5,567Top 4%
Canon: 13 patents #5,080 of 19,416Top 30%
FI Fujikin Incorporated: 5 patents #85 of 318Top 30%
CK Ckd: 1 patents #167 of 332Top 55%
NE Nec Electronics: 1 patents #715 of 1,789Top 40%
TL Tokyo Electron Tohoku Limited: 1 patents #33 of 103Top 35%
TC Toshiba Ceramics Co.: 1 patents #190 of 458Top 45%
NE Nec: 1 patents #7,889 of 14,502Top 55%
EC Ebara Research Co.: 1 patents #23 of 45Top 55%
HC Horiba Stec, Co.: 1 patents #86 of 163Top 55%
Overall (All Time): #82,438 of 4,157,543Top 2%
39
Patents All Time

Issued Patents All Time

Showing 1–25 of 39 patents

Patent #TitleCo-InventorsDate
11761075 Substrate cleaning apparatus Yukimasa Saito, Toshiki HINATA, Kazuya Dobashi, Kyoko Ikeda 2023-09-19
10786837 Method for cleaning chamber of substrate processing apparatus Yukimasa Saito, Toshiki HINATA, Kazuya Dobashi, Kyoko Ikeda 2020-09-29
10312101 Substrate processing method and substrate processing apparatus Masahiko Tomita 2019-06-04
9691630 Etching method Nobuhiro Takahashi, Tetsuro Takahashi, Masashi Matsumoto, Junichiro MATSUNAGA 2017-06-27
9435470 Pipe joint Tsuneyuki Okabe, Kenichi Sato, Tomohiro Nakata, Tsutomu Shinohara, Michio Yamaji 2016-09-06
9371946 Pipe joint Tsuneyuki Okabe, Kenichi Sato, Tomohiro Nakata, Tsutomu Shinohara, Michio Yamaji 2016-06-21
9236272 Etching apparatus and etching method 2016-01-12
9150965 Processing apparatus Toyohiko Shindo, Noboru Tamura 2015-10-06
9026011 Image forming apparatus Kenta Kubo, Juun Horie, Tomoaki Miyazawa, Hirokazu Usami, Tomohito Ishida +2 more 2015-05-05
9012331 Etching method and non-transitory storage medium Atsushi Ando, Jun Sonobe, Christopher Turpin 2015-04-21
8893743 Flow rate controller and processing apparatus Tsuneyuki Okabe, Kazushige Matsuno 2014-11-25
8434522 Fluid control apparatus Wataru Okase, Tomohiro Nakata, Tsutomu Shinohara, Michio Yamaji 2013-05-07
8381755 Pressure type flow rate control reference and corrosion resistant pressure type flow rate controller used for the same Wataru Okase, Tsutomu Shinohara, Nobukazu Ikeda, Michio Yamaji, Yasutaka Hayashi +2 more 2013-02-26
8219329 Thermal type mass flow meter, and thermal type mass flow control device Hiroyuki Ebi, Tetsuo Shimizu, Hitoshi Kitagawa, Tsuneyuki Okabe 2012-07-10
8210022 Pressure type flow rate control reference and corrosion resistant pressure type flow rate controller used for the same Wataru Okase, Tsutomu Shinohara, Nobukazu Ikeda, Michio Yamaji, Yasutaka Hayashi +2 more 2012-07-03
8104516 Gas supply unit and gas supply system Hideki Nagaoka, Tsuneyuki Okabe, Hiroshi Itafuji, Hiroki Doi, Minoru Ito 2012-01-31
8019260 Image forming apparatus Rie Endo, Katsuhiro Sakaizawa, Norio Takahashi 2011-09-13
7962076 Image forming apparatus Rie Endo, Katsuhiro Sakaizawa, Norio Takahashi 2011-06-14
7862638 Gas supply system for semiconductor manufacturing apparatus Ken Nakao 2011-01-04
7734205 Image forming apparatus Katsuhiro Sakaizawa, Norio Takahashi, Rie Endo 2010-06-08
7682843 Semiconductor fabrication system, and flow rate correction method and program for semiconductor fabrication system Tsuneyuki Okabe, Hiroyuki Ebi, Tetsuo Shimizu, Hitoshi Kitagawa 2010-03-23
7440718 Developing apparatus featuring image defect supression Kazunari Hagiwara, Kenya Ogawa, Naoto Kichijima, Yasushi Shimizu, Koichi Okuda 2008-10-21
7383003 Developing apparatus for preventing ghost images and uneven image density Naoto Kichijima, Koichi Okuda, Yasushi Shimizu, Kenya Ogawa, Kazunari Hagiwara 2008-06-03
7379693 Developing apparatus Kenya Ogawa, Yasushi Shimizu, Kazunari Hagiwara, Naoto Kichijima, Koichi Okuda 2008-05-27
7251441 Developing apparatus including magnetic field generating means, for use with a developer which includes a magnetic toner component Kazunari Hagiwara, Kouichi Okuda, Yasushi Shimizu, Kenya Ogawa, Hikaru Osada 2007-07-31