Issued Patents All Time
Showing 26–39 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7239831 | Image forming apparatus when a maximum developing bias voltage |V| max and surface potential Vd of a charged image bearing member satisfy: |V| max≦|Vd| | Kazunari Hagiwara, Kouichi Okuda, Yasunori Chigono, Yasushi Shimizu, Hikaru Osada | 2007-07-03 |
| 7233758 | Developing apparatus featuring a developer carrying member with an elastic surface layer | Hikaru Osada, Kouichi Okuda, Yasushi Shimizu, Yasunori Chigono, Kenya Ogawa +1 more | 2007-06-19 |
| 6834613 | Plasma-resistant member and plasma treatment apparatus using the same | Akira Miyazaki, Keiji Morita, Sachiyuki Nagasaka | 2004-12-28 |
| 6737666 | Apparatus and method for detecting an end point of a cleaning process | Natsuko Ito, Tsuyoshi Moriya, Fumihiko Uesugi, Yoshinori Kato, Masaru Aomori +1 more | 2004-05-18 |
| 6738593 | Developing device with developer bearing member overlying developer containing chamber | Takeshi Kawamura, Tetsuya Sano, Ken Nakagawa, Hikaru Osada, Kenji Kanari | 2004-05-18 |
| 6614004 | Heater including heat dissipation resistor on substrate and image heating apparatus equipped with the heater | Kazuaki Ono | 2003-09-02 |
| 6516166 | Image fixing apparatus | Hiroyuki Sakakibara, Satoshi Nishida | 2003-02-04 |
| 6346425 | Vapor-phase processing method capable of eliminating particle formation | Natsuko Ito, Tsuyoshi Moriya, Fumihiko Uesugi, Masaru Aomori, Yoshinori Kato +1 more | 2002-02-12 |
| 5578129 | Gas supplying head and load lock chamber of semiconductor processing system | — | 1996-11-26 |
| 5494522 | Plasma process system and method | Masahiro Ogasawara, Jun Yashiro, Yoshifumi Tahara, Satoru Kawakami, Susumu Tanaka | 1996-02-27 |
| 5441076 | Processing apparatus using gas | Takenobu Matsuo, Tsuyoshi Wakabayashi, Kazutoshi Miura, Takahiro Mori | 1995-08-15 |
| 5439026 | Processing apparatus and flow control arrangement therefor | Takenobu Matsuo, Tsuyoshi Wakabayashi | 1995-08-08 |
| 5421365 | Flow control apparatus | Takenobu Matsuo, Tsuyoshi Wakabayashi | 1995-06-06 |
| 5294280 | Gas measuring device and processing apparatus provided with the gas measuring device | Tsuyoshi Wakabayashi, Takenobu Matsuo, Hidenobu Arimitsu | 1994-03-15 |