WO

Wataru Okase

TL Tokyo Electron Limited: 30 patents #129 of 5,567Top 3%
TL Tokyo Electron Tohoku Limited: 10 patents #1 of 103Top 1%
FI Fujikin Incorporated: 3 patents #115 of 318Top 40%
TS Tokyo Electron Sagami: 3 patents #10 of 81Top 15%
TL Toyko Electron Limited: 1 patents #1 of 31Top 4%
Overall (All Time): #103,753 of 4,157,543Top 3%
34
Patents All Time

Issued Patents All Time

Showing 1–25 of 34 patents

Patent #TitleCo-InventorsDate
8434522 Fluid control apparatus Shuji Moriya, Tomohiro Nakata, Tsutomu Shinohara, Michio Yamaji 2013-05-07
8381755 Pressure type flow rate control reference and corrosion resistant pressure type flow rate controller used for the same Shuji Moriya, Tsutomu Shinohara, Nobukazu Ikeda, Michio Yamaji, Yasutaka Hayashi +2 more 2013-02-26
8210022 Pressure type flow rate control reference and corrosion resistant pressure type flow rate controller used for the same Shuji Moriya, Tsutomu Shinohara, Nobukazu Ikeda, Michio Yamaji, Yasutaka Hayashi +2 more 2012-07-03
7112268 Plating device and plating method Takenobu Matsuo 2006-09-26
6953522 Liquid treatment method using alternating electrical contacts Kyungho Park, Takenobu Matsuo 2005-10-11
6949719 Thermal insulator having a honeycomb structure and heat recycle system using the thermal insulator Osamu Suenaga, Takenobu Matsuo 2005-09-27
6756565 Thermal insulator having a honeycomb structure and heat recycle system using the thermal insulator Osamu Suenaga, Takenobu Matsuo 2004-06-29
6740164 Plating apparatus and method of manufacturing semiconductor device Takenobu Matsuo 2004-05-25
6716329 Processing apparatus and processing system Takenobu Matsuo 2004-04-06
6641709 Mist trap mechanism and method for plating apparatus Koichiro Kimura, Takenobu Matsuo 2003-11-04
6634370 Liquid treatment system and liquid treatment method Satoshi Nakashima, Takenobu Matsuo, Tameyasu Hyakuzuka, Yasushi Yagi, Yoshiyuki Harima +6 more 2003-10-21
6497767 Thermal processing unit for single substrate Yasushi Yagi 2002-12-24
6473993 Thermal treatment method and apparatus Yasushi Yagi, Takeshi Sakuma, Masayuki Kitamura, Hironori Yagi, Eisuke Morisaki 2002-11-05
6402848 Single-substrate-treating apparatus for semiconductor processing system Takahiro Horiguchi, Eiichiro Takanabe 2002-06-11
6399922 Single-substrate-heat-treating apparatus for semiconductor process system Masaaki Hasei 2002-06-04
6322631 Heat treatment method and its apparatus 2001-11-27
6228173 Single-substrate-heat-treating apparatus for semiconductor process system Masaaki Hasei 2001-05-08
6121579 Heating apparatus, and processing apparatus Kazutsugu Aoki, Hironori Yagi, Masamichi Nomura 2000-09-19
6036482 Heat treatment method 2000-03-14
5903711 Heat treatment apparatus and heat treatment method 1999-05-11
5884009 Substrate treatment system 1999-03-16
5862302 Thermal processing apparatus having a reaction tube with transparent and opaque portions 1999-01-19
5749723 Heat treatment apparatus 1998-05-12
5678989 Heat treatment method using a vertical processing tube 1997-10-21
5662469 Heat treatment method Yasushi Yagi, Satoshi Kawachi 1997-09-02