Issued Patents All Time
Showing 1–25 of 118 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10811252 | Pattern-forming method | Ryosuke Yamamoto, Ryuichi Saito, Seiji Morita, Ryoichi Suzuki, Takeharu MOTOKAWA +1 more | 2020-10-20 |
| 9922991 | Semiconductor memory device and method for manufacturing same | Tetsuya Kamigaki, Isahiro Hasegawa, Shinichi Ito, Tatsuhiko Higashiki, Kei Hattori +2 more | 2018-03-20 |
| 8885949 | Pattern shape determining method, pattern shape verifying method, and pattern correcting method | Shigeki Nojima, Tetsuaki Matsunawa | 2014-11-11 |
| 8654313 | Exposing method and method of manufacturing semiconductor device | Masanori Takahashi, Takashi Sato, Satoshi Tanaka, Takamasa Takaki | 2014-02-18 |
| 8440376 | Exposure determining method, method of manufacturing semiconductor device, and computer program product | Toshiya Kotani, Kazuya Fukuhara, Michiya Takimoto, Hidefumi Mukai | 2013-05-14 |
| RE43659 | Method for making a design layout of a semiconductor integrated circuit | Toshiya Kotani, Satoshi Tanaka | 2012-09-11 |
| 8261214 | Pattern layout creation method, program product, and semiconductor device manufacturing method | Shimon Maeda, Masahiro Miyairi | 2012-09-04 |
| 8183119 | Semiconductor device fabrication method using multiple mask patterns | Koji Hashimoto, Kazuhiro Takahata, Kei Yoshikawa | 2012-05-22 |
| 8163611 | Semiconductor device fabrication method and semiconductor device | Koji Hashimoto, Kazuhiro Takahata, Kei Yoshikawa | 2012-04-24 |
| 8158527 | Semiconductor device fabrication method using multiple resist patterns | Koji Hashimoto, Kazuhiro Takahata, Kei Yoshikawa | 2012-04-17 |
| 8142961 | Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method | Toshiya Kotani, Satoshi Tanaka, Shigeki Nojima, Koji Hashimoto | 2012-03-27 |
| 8121387 | Mask pattern verifying method | Mitsuyo Asano, Shinji Yamaguchi, Satoshi Tanaka, Masamitsu Itoh, Osamu Ikenaga | 2012-02-21 |
| 8086973 | Pattern management method and pattern management program | Kenji Yoshida | 2011-12-27 |
| 8046722 | Method for correcting a mask pattern, system for correcting a mask pattern, program, method for manufacturing a photomask and method for manufacturing a semiconductor device | Toshiya Kotani, Satoshi Tanaka | 2011-10-25 |
| 7966584 | Pattern-producing method for semiconductor device | Suigen Kyoh, Toshiya Kotani | 2011-06-21 |
| 7934175 | Parameter adjustment method, semiconductor device manufacturing method, and recording medium | Toshiya Kotani, Yasunobu Kai, Satoshi Tanaka, Shigeki Nojima, Kazuyuki Masukawa +1 more | 2011-04-26 |
| RE42302 | Method for making a design layout and mask | Toshiya Kotani, Satoshi Tanaka | 2011-04-19 |
| RE42294 | Semiconductor integrated circuit designing method and system using a design rule modification | Toshiya Kotani, Satoshi Tanaka | 2011-04-12 |
| 7824996 | Semiconductor device fabrication method and semiconductor device | Koji Hashimoto, Kazuhiro Takahata, Kei Yoshikawa | 2010-11-02 |
| 7821628 | Mask defect inspection computer program product | Shinji Yamaguchi, Satoshi Tanaka, Mari Inoue | 2010-10-26 |
| 7794897 | Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method | Toshiya Kotani, Satoshi Tanaka, Shigeki Nojima, Koji Hashimoto | 2010-09-14 |
| 7788626 | Pattern data correction method, pattern checking method, pattern check program, photo mask producing method, and semiconductor device manufacturing method | Shigeki Nojima, Satoshi Tanaka, Toshiya Kotani, Kyoko Izuha | 2010-08-31 |
| 7596776 | Light intensity distribution simulation method and computer program product | Satoshi Tanaka, Shoji Mimotogi, Takashi Sato | 2009-09-29 |
| 7594216 | Method and system for forming a mask pattern, method of manufacturing a semiconductor device, system forming a mask pattern on data, cell library and method of forming a photomask | Toshiya Kotani, Satoshi Tanaka | 2009-09-22 |
| 7556896 | Inspection method and photomask | Kazuya Fukuhara, Satoshi Tanaka | 2009-07-07 |