Issued Patents All Time
Showing 1–25 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8809072 | Sub-resolution assist feature arranging method and computer program product and manufacturing method of semiconductor device | Chikaaki Kodama, Toshiya Kotani, Shigeki Nojima | 2014-08-19 |
| 8381138 | Simulation model creating method, computer program product, and method of manufacturing a semiconductor device | Tetsuaki Matsunawa, Masafumi Asano | 2013-02-19 |
| 8230369 | Simulation method and simulation program | Akiko Mimotogi, Satoshi Tanaka, Takashi Sato | 2012-07-24 |
| 8154710 | Lithography process window analyzing method and analyzing program | Yasuharu Sato | 2012-04-10 |
| 8077292 | Projection exposure method | Yosuke Kitamura, Masaki Satake, Kazuya Fukuhara | 2011-12-13 |
| 8055366 | Simulation model creating method, mask data creating method and semiconductor device manufacturing method | Masafumi Asano | 2011-11-08 |
| 7912275 | Method of evaluating a photo mask and method of manufacturing a semiconductor device | Hiroki Yamamoto, Masamitsu Itoh, Osamu Ikenaga, Hideki Kanai, Yukiyasu Arisawa | 2011-03-22 |
| 7840390 | Creating method of simulation model, manufacturing method of photo mask, manufacturing method of semiconductor device, and recording medium | Masaki Satake | 2010-11-23 |
| 7793252 | Mask pattern preparation method, semiconductor device manufacturing method and recording medium | Toshiya Kotani, Shigeki Nojima | 2010-09-07 |
| 7685556 | Mask data correction method, photomask manufacturing method, computer program, optical image prediction method, resist pattern shape prediction method, and semiconductor device manufacturing method | Kazuya Fukuhara, Daisuke Kawamura | 2010-03-23 |
| 7636910 | Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor device | Yukiyasu Arisawa, Tadahito Fujisawa | 2009-12-22 |
| 7596776 | Light intensity distribution simulation method and computer program product | Satoshi Tanaka, Takashi Sato, Soichi Inoue | 2009-09-29 |
| 7575835 | Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure method | Takashi Sato, Shigeru Hasebe | 2009-08-18 |
| 7560197 | Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing method | Hiroko Nakamura, Toshiya Kotani, Satoshi Tanaka | 2009-07-14 |
| 7446852 | Projection exposure mask acceptance decision system, projection exposure mask acceptance decision method, method for manufacturing semiconductor device, and computer program project | Yukiyasu Arisawa, Shigeru Hasebe | 2008-11-04 |
| 7426712 | Lithography simulation method and recording medium | Toshiya Kotani, Shigeki Nojima | 2008-09-16 |
| 7336341 | Simulator of lithography tool for correcting focus error and critical dimension, simulation method for correcting focus error and critical dimension, and computer medium for storing computer program for simulator | Daisuke Kawamura, Akiko Yamada | 2008-02-26 |
| 7319944 | Method for a predicting a pattern shape by using an actual measured dissolution rate of a photosensitive resist | Hiroko Nakamura, Yasunobu Onishi | 2008-01-15 |
| 7248349 | Exposure method for correcting a focal point, and a method for manufacturing a semiconductor device | Takashi Sato, Takahiro Ikeda, Soichi Inoue | 2007-07-24 |
| 7229721 | Method for evaluating photo mask and method for manufacturing semiconductor device | Shigeki Nojima, Osamu Ikenaga | 2007-06-12 |
| 7148138 | Method of forming contact hole and method of manufacturing semiconductor device | Hiroko Nakamura, Kazuya Fukuhara, Satoshi Tanaka, Soichi Inoue | 2006-12-12 |
| 7118834 | Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure method | Takashi Sato, Shigeru Hasebe | 2006-10-10 |
| 7090949 | Method of manufacturing a photo mask and method of manufacturing a semiconductor device | Shigeki Nojima, Satoshi Tanaka, Toshiya Kotani, Shigeru Hasebe, Koji Hashimoto +2 more | 2006-08-15 |
| 6988016 | Method for evaluating lithography process margins | — | 2006-01-17 |
| 6967719 | Method for inspecting exposure apparatus, exposure method for correcting focal point, and method for manufacturing semiconductor device | Takashi Sato, Takahiro Ikeda, Soichi Inoue | 2005-11-22 |