Issued Patents All Time
Showing 1–25 of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10943048 | Defect inspection apparatus and defect inspection method | Kazuhiro Nojima, Tomohide Tezuka, Atsushi Onishi, Kazuhiro Yamada, Akira Hamaguchi | 2021-03-09 |
| 10040219 | Mold and mold manufacturing method | Yoko Takekawa, Ryouichi Inanami, Masafumi Asano, Kazuhiro Takahata, Sachiko Kobayashi +3 more | 2018-08-07 |
| 9977855 | Method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor device | Chikaaki Kodama, Koichi Nakayama, Toshiya Kotani, Fumiharu Nakajima, Hirotaka Ichikawa | 2018-05-22 |
| 9953126 | Method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor device | Chikaaki Kodama, Koichi Nakayama, Toshiya Kotani, Fumiharu Nakajima, Hirotaka Ichikawa | 2018-04-24 |
| 8885949 | Pattern shape determining method, pattern shape verifying method, and pattern correcting method | Tetsuaki Matsunawa, Soichi Inoue | 2014-11-11 |
| 8809072 | Sub-resolution assist feature arranging method and computer program product and manufacturing method of semiconductor device | Chikaaki Kodama, Toshiya Kotani, Shoji Mimotogi | 2014-08-19 |
| 8402407 | Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method | — | 2013-03-19 |
| 8336004 | Dimension assurance of mask using plurality of types of pattern ambient environment | Tetsuaki Matsunawa, Shigeru Hasebe, Masahiro Miyairi | 2012-12-18 |
| 8142961 | Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method | Toshiya Kotani, Satoshi Tanaka, Koji Hashimoto, Soichi Inoue | 2012-03-27 |
| 8078996 | Method and system for correcting a mask pattern design | Kyoko Izuha, Toshiya Kotani, Satoshi Tanaka | 2011-12-13 |
| 7949967 | Design Pattern correcting method, process proximity effect correcting method, and semiconductor device manufacturing method | Toshiya Kotani, Shimon Maeda | 2011-05-24 |
| 7934175 | Parameter adjustment method, semiconductor device manufacturing method, and recording medium | Toshiya Kotani, Yasunobu Kai, Soichi Inoue, Satoshi Tanaka, Kazuyuki Masukawa +1 more | 2011-04-26 |
| 7895541 | Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method | — | 2011-02-22 |
| 7890908 | Method for verifying mask pattern data, method for manufacturing mask, mask pattern verification program, and method for manufacturing semiconductor device | Yoko Oikawa, Satoshi Tanaka | 2011-02-15 |
| 7794897 | Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method | Toshiya Kotani, Satoshi Tanaka, Koji Hashimoto, Soichi Inoue | 2010-09-14 |
| 7793252 | Mask pattern preparation method, semiconductor device manufacturing method and recording medium | Toshiya Kotani, Shoji Mimotogi | 2010-09-07 |
| 7788626 | Pattern data correction method, pattern checking method, pattern check program, photo mask producing method, and semiconductor device manufacturing method | Satoshi Tanaka, Toshiya Kotani, Kyoko Izuha, Soichi Inoue | 2010-08-31 |
| 7730445 | Pattern data verification method for semiconductor device, computer-readable recording medium having pattern data verification program for semiconductor device recorded, and semiconductor device manufacturing method | — | 2010-06-01 |
| 7600213 | Pattern data verification method, pattern data creation method, exposure mask manufacturing method, semiconductor device manufacturing method, and computer program product | Akira Hamaguchi | 2009-10-06 |
| 7571417 | Method and system for correcting a mask pattern design | Kyoko Izuha, Toshiya Kotani, Satoshi Tanaka | 2009-08-04 |
| 7546178 | Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device | Takuya Kouno, Tatsuhiko Higashiki | 2009-06-09 |
| 7526748 | Design pattern data preparing method, mask pattern data preparing method, mask manufacturing method, semiconductor device manufacturing method, and program recording medium | Toshiya Kotani, Satoshi Tanaka, Soichi Inoue | 2009-04-28 |
| 7426712 | Lithography simulation method and recording medium | Toshiya Kotani, Shoji Mimotogi | 2008-09-16 |
| 7337426 | Pattern correcting method, mask making method, method of manufacturing semiconductor device, pattern correction system, and computer-readable recording medium having pattern correction program recorded therein | Toshiya Kotani, Kazuhito Kobayashi | 2008-02-26 |
| 7278125 | Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method | — | 2007-10-02 |