Issued Patents All Time
Showing 26–37 of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7269470 | Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device | Takuya Kouno, Tatsuhiko Higashiki | 2007-09-11 |
| 7229721 | Method for evaluating photo mask and method for manufacturing semiconductor device | Shoji Mimotogi, Osamu Ikenaga | 2007-06-12 |
| 7213226 | Pattern dimension correction method and verification method using OPC, mask and semiconductor device fabricated by using the correction method, and system and software product for executing the correction method | Toshiya Kotani | 2007-05-01 |
| 7194704 | Design layout preparing method | Toshiya Kotani, Suigen Kyoh, Kyoko Izuha, Ryuji Ogawa, Satoshi Tanaka +2 more | 2007-03-20 |
| 7164960 | Apparatus for correcting a plurality of exposure tools, method for correcting a plurality of exposure tools, and method for manufacturing semiconductor device | Nobuhiro Komine, Keita Asanuma | 2007-01-16 |
| 7131106 | Integrated circuit pattern designing method, exposure mask manufacturing method, exposure mask, and integrated circuit device manufacturing method | Koji Hashimoto, Shingo Tokutome | 2006-10-31 |
| 7090949 | Method of manufacturing a photo mask and method of manufacturing a semiconductor device | Shoji Mimotogi, Satoshi Tanaka, Toshiya Kotani, Shigeru Hasebe, Koji Hashimoto +2 more | 2006-08-15 |
| 7008731 | Method of manufacturing a photomask and method of manufacturing a semiconductor device using the photomask | Osamu Ikenaga | 2006-03-07 |
| 6727026 | Semiconductor integrated circuit patterns | Tatsuaki Kuji, Koji Hashimoto, Satoshi Usui | 2004-04-27 |
| 6649310 | Method of manufacturing photomask | Masamitsu Itoh, Shoji Mimotogi, Osamu Ikenaga | 2003-11-18 |
| 6333203 | Method of forming a resist pattern | Koji Hashimoto | 2001-12-25 |
| 6334209 | Method for exposure-mask inspection and recording medium on which a program for searching for portions to be measured is recorded | Koji Hashimoto | 2001-12-25 |