Issued Patents All Time
Showing 1–25 of 70 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9884350 | Reticle chuck cleaner | Katsuya Okumura, Taro Inada, Jun Watanabe | 2018-02-06 |
| 9808841 | Reticle chuck cleaner and reticle chuck cleaning method | Yoshihito Kobayashi, Taro Inada, Jun Watanabe | 2017-11-07 |
| 9412592 | Imprint mask, method for manufacturing the same, and method for manufacturing semiconductor device | Shingo Kanamitsu | 2016-08-09 |
| 9377682 | Template substrate, method for manufacturing same, and template | Shingo Kanamitsu | 2016-06-28 |
| 9034467 | Reticle chuck cleaner | Katsuya Okumura, Taro Inada, Jun Watanabe | 2015-05-19 |
| 8771905 | Exposure mask and method for manufacturing same and method for manufacturing semiconductor device | — | 2014-07-08 |
| 8758005 | Imprint mask, method for manufacturing the same, and method for manufacturing semiconductor device | Shingo Kanamitsu | 2014-06-24 |
| 8669522 | Mask inspection apparatus and mask inspection method | Shinji Yamaguchi, Masato Naka, Hiroyuki Kashiwagi | 2014-03-11 |
| 8658537 | Mask manufacturing method for nanoimprinting | — | 2014-02-25 |
| 8653483 | Mask manufacturing device | — | 2014-02-18 |
| 8584054 | Photomask manufacturing method and semiconductor device manufacturing method | Takashi Hirano, Kazuya Fukuhara | 2013-11-12 |
| 8533634 | Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product | — | 2013-09-10 |
| 8502171 | Mask manufacturing device | — | 2013-08-06 |
| 8465907 | Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server | — | 2013-06-18 |
| 8407629 | Pattern verification-test method, optical image intensity distribution acquisition method, and computer program | Satoshi Tanaka | 2013-03-26 |
| 8407628 | Photomask manufacturing method and semiconductor device manufacturing method | Takashi Hirano, Kazuya Fukuhara | 2013-03-26 |
| 8274047 | Substrate surface inspection method and inspection apparatus | Yoshihiko Naito, Norio Kimura, Kenji Terao, Masahiro Hatakeyama | 2012-09-25 |
| 8227267 | Template inspection method and manufacturing method for semiconductor device | Ikuo Yoneda, Tetsuro Nakasugi, Ryoichi Inanami | 2012-07-24 |
| 8222051 | Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server | — | 2012-07-17 |
| 8219942 | Pattern verification-test method, optical image intensity distribution acquisition method, and computer program | Satoshi Tanaka | 2012-07-10 |
| 8216744 | Exposure mask and method for manufacturing same and method for manufacturing semiconductor device | — | 2012-07-10 |
| 8193100 | Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product | — | 2012-06-05 |
| 8189903 | Photomask evaluation based on lithographic simulation using sidewall angle of photomask pattern | — | 2012-05-29 |
| 8121387 | Mask pattern verifying method | Mitsuyo Asano, Shinji Yamaguchi, Satoshi Tanaka, Soichi Inoue, Osamu Ikenaga | 2012-02-21 |
| 8097539 | Imprint mask manufacturing method for nanoimprinting | — | 2012-01-17 |