Issued Patents All Time
Showing 1–25 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11143950 | Mask manufacturing method and mask set | Yuki Akamatsu, Takashi Koike | 2021-10-12 |
| 10599045 | Exposure method, exposure system, and manufacturing method for semiconductor device | Yoshio MIZUTA | 2020-03-24 |
| 10488754 | Imprint apparatus and manufacturing method of semiconductor device | — | 2019-11-26 |
| 10295409 | Substrate measurement system, method of measuring substrate, and computer program product | Miki Toshima, Satoshi Usui, Manabu Takakuwa, Takaki Hashimoto | 2019-05-21 |
| 9952505 | Imprint device and pattern forming method | Yosuke Okamoto, Kazuhiro Segawa, Manabu Takakuwa, Kentaro Kasa | 2018-04-24 |
| 9885960 | Pattern shape adjustment method, pattern shape adjustment system, exposure apparatus, and recording medium | Kazuya Fukuhara, Kazuo Tawarayama | 2018-02-06 |
| 9784573 | Positional deviation measuring device, non-transitory computer-readable recording medium containing a positional deviation measuring program, and method of manufacturing semiconductor device | Hidenori Sato, Yosuke Okamoto, Manabu Takakuwa | 2017-10-10 |
| 9772566 | Mask alignment mark, photomask, exposure apparatus, exposure method, and manufacturing method of device | Kazuo Tawarayama | 2017-09-26 |
| 9760017 | Wafer lithography equipment | Kazufumi Shiozawa, Toshihide Kawachi, Masamichi Kishimoto, Yoshimitsu Kato | 2017-09-12 |
| 9741564 | Method of forming mark pattern, recording medium and method of generating mark data | Yuji Setta, Taketo Kuriyama | 2017-08-22 |
| 9703912 | Mask set, fabrication method of mask set, manufacturing method of semiconductor device, and recording medium | Ai FURUBAYASHI, Takashi Obara, Takaki Hashimoto | 2017-07-11 |
| 9632407 | Mask processing apparatus and mask processing method | Hidenori Sato, Manabu Takakuwa, Taketo Kuriyama | 2017-04-25 |
| 9459093 | Deflection measuring device and deflection measuring method | Hidenori Sato | 2016-10-04 |
| 9429849 | Adjusting method of pattern transferring plate, laser application machine and pattern transferring plate | Hidenori Sato | 2016-08-30 |
| 9396299 | Reticle mark arrangement method and nontransitory computer readable medium storing a reticle mark arrangement program | Shinichi Nakagawa, Kazuhiro Segawa, Manabu Takakuwa, Motohiro Okada | 2016-07-19 |
| 9368413 | Light exposure condition analysis method, nontransitory computer readable medium storing a light exposure condition analysis program, and manufacturing method for a semiconductor device | Yoshimitsu Kato, Kazufumi Shiozawa | 2016-06-14 |
| 9354527 | Overlay displacement amount measuring method, positional displacement amount measuring method and positional displacement amount measuring apparatus | Hidenori Sato | 2016-05-31 |
| 9260300 | Pattern formation method and pattern formation apparatus | Kentaro Matsunaga, Eiji Yoneda | 2016-02-16 |
| 9239526 | Exposure apparatus and transfer characteristics measuring method | Hidenori Sato, Kazuhiro Segawa | 2016-01-19 |
| 9128388 | Method of focus measurement, exposure apparatus, and method of manufacturing semiconductor device | — | 2015-09-08 |
| 9104115 | Method for controlling exposure apparatus and exposure apparatus | — | 2015-08-11 |
| 8976356 | Measurement mark, method for measurement, and measurement apparatus | Yosuke Okamoto | 2015-03-10 |
| 8928871 | Reflective mask | Masaru Suzuki | 2015-01-06 |
| 8907346 | Imprint apparatus, imprint method, and manufacturing method of semiconductor device | Takeshi Koshiba | 2014-12-09 |
| 8343692 | Exposure apparatus inspection mask and exposure apparatus inspection method | Kazuya Fukuhara | 2013-01-01 |