Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11769744 | Semiconductor device and method for manufacturing the same | — | 2023-09-26 |
| 11626376 | Semiconductor device having a plurality of first structural bodies provided below a connection terminal and manufacturing method thereof | — | 2023-04-11 |
| 11195849 | Semiconductor device and method of manufacturing the same | Yasuhito Yoshimizu, Masaru Kito | 2021-12-07 |
| 9853052 | Semiconductor device and method for manufacturing same | — | 2017-12-26 |
| 9741564 | Method of forming mark pattern, recording medium and method of generating mark data | Taketo Kuriyama, Nobuhiro Komine | 2017-08-22 |
| 9698157 | Microstructure device and method for manufacturing the same | Yuko Kono, Takaki Hashimoto, Toshiya Kotani, Chikaaki Kodama | 2017-07-04 |
| 9455271 | Semiconductor memory device and method of manufacturing semiconductor memory device and method of layouting auxiliary pattern | — | 2016-09-27 |
| 8910096 | Focus position adjusting apparatus, reticle, focus position adjusting program, and method of manufacturing semiconductor device | — | 2014-12-09 |
| 8349540 | Semiconductor device manufacturing method | Hiroki Futatsuya | 2013-01-08 |
| 8349541 | Semiconductor device manufacturing method | Hiroki Futatsuya | 2013-01-08 |
| 8093156 | Method for manufacturing semiconductor device | Hajime Yamamoto | 2012-01-10 |
| 8043948 | Semiconductor device manufacturing method and design support apparatus | — | 2011-10-25 |
| 7927764 | Exposure mask and method of manufacturing a semiconductor device | — | 2011-04-19 |
| 7723230 | Method for manufacturing semiconductor device and method for designing photomask pattern | — | 2010-05-25 |
| 7659040 | Exposure mask and method of manufacturing the same, and semiconductor device manufacturing method | — | 2010-02-09 |
| 7138312 | Semiconductor device and method for fabricating the same | Takayoshi Minami | 2006-11-21 |
| 7064395 | Semiconductor device and method for fabricating the same | Takayoshi Minami | 2006-06-20 |