Issued Patents All Time
Showing 1–25 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11984313 | Semiconductor wafer, manufacturing method for semiconductor wafer, and manufacturing method for semiconductor device | Takashi Koike | 2024-05-14 |
| 11935775 | Semiconductor manufacturing apparatus and method of manufacturing semiconductor device | Satoshi Nagai, Satoshi Usui | 2024-03-19 |
| 11715660 | Position measuring apparatus and measuring method | — | 2023-08-01 |
| 11460765 | Exposure method, exposure apparatus, and semiconductor device manufacturing method | Hayato Terai | 2022-10-04 |
| 11267237 | Substrate bonding apparatus | Hayato Terai | 2022-03-08 |
| 11152218 | Template, imprint apparatus, imprint method and imprint apparatus management method | — | 2021-10-19 |
| 10921722 | Exposure apparatus, exposure method, and semiconductor device manufacturing method | — | 2021-02-16 |
| 10627726 | Patterning support system, patterning method, and nonvolatile recording medium | — | 2020-04-21 |
| 10295409 | Substrate measurement system, method of measuring substrate, and computer program product | Miki Toshima, Satoshi Usui, Nobuhiro Komine, Takaki Hashimoto | 2019-05-21 |
| 10283392 | Alignment method, pattern formation system, and exposure device | — | 2019-05-07 |
| 10276459 | Measurement method, measurement program, and measurement system | Kenji Konomi | 2019-04-30 |
| 10241397 | Imprint apparatus and imprint method | Yoshihisa Kawamura, Ikuo Yoneda | 2019-03-26 |
| 10093044 | Imprinting apparatus and imprinting method | Yoshio MIZUTA, Masato Suzuki | 2018-10-09 |
| 9966284 | Alignment method, pattern formation system, and exposure device | — | 2018-05-08 |
| 9966316 | Deposition supporting system, depositing apparatus and manufacturing method of a semiconductor device | — | 2018-05-08 |
| 9952505 | Imprint device and pattern forming method | Yosuke Okamoto, Nobuhiro Komine, Kazuhiro Segawa, Kentaro Kasa | 2018-04-24 |
| 9941177 | Pattern accuracy detecting apparatus and processing system | Kentaro Kasa, Kazuya Fukuhara, Kazutaka Ishigo, Yoshinori Hagio, Kazuhiro Segawa +4 more | 2018-04-10 |
| 9784573 | Positional deviation measuring device, non-transitory computer-readable recording medium containing a positional deviation measuring program, and method of manufacturing semiconductor device | Hidenori Sato, Yosuke Okamoto, Nobuhiro Komine | 2017-10-10 |
| 9632407 | Mask processing apparatus and mask processing method | Hidenori Sato, Nobuhiro Komine, Taketo Kuriyama | 2017-04-25 |
| 9541847 | Imprint method and imprint system | Masato Suzuki, Takuya Kono, Kazuya Fukuhara | 2017-01-10 |
| 9396299 | Reticle mark arrangement method and nontransitory computer readable medium storing a reticle mark arrangement program | Shinichi Nakagawa, Nobuhiro Komine, Kazuhiro Segawa, Motohiro Okada | 2016-07-19 |
| 9240336 | Imprint method and imprint apparatus | — | 2016-01-19 |
| 9188879 | Substrate holding apparatus, pattern transfer apparatus, and pattern transfer method | Kentaro Kasa, Ryoichi Inanami, Kazuto Matsuki, Tetsuro Nakasugi, Hiroshi Koizumi +1 more | 2015-11-17 |
| 9087875 | Pattern formation method for manufacturing semiconductor device using phase-separating self-assembling material | Masaki Hirano | 2015-07-21 |
| 8953163 | Exposure apparatus, exposure method, and method of manufacturing semiconductor device | Kentaro Kasa, Yosuke Okamoto, Masamichi Kishimoto | 2015-02-10 |