Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10018915 | Pattern forming method | Ryoichi Suzuki, Shinichi Ito, Seiji Morita | 2018-07-10 |
| 9960007 | Electron beam irradiation device | Ryoichi Susuki, Hiroyuki Kashiwagi, Takashi Sato | 2018-05-01 |
| 9188879 | Substrate holding apparatus, pattern transfer apparatus, and pattern transfer method | Kentaro Kasa, Manabu Takakuwa, Ryoichi Inanami, Tetsuro Nakasugi, Hiroshi Koizumi +1 more | 2015-11-17 |
| 7539222 | Method of operating laser light source | — | 2009-05-26 |
| 7359043 | Pattern inspecting method and pattern inspecting apparatus | Hideo Tsuchiya, Yoshihide Kato, Yasushi Sanada, Riki Ogawa, Takuro Nagao | 2008-04-15 |
| 6319642 | Electron beam exposure apparatus | Shigehiro Hara, Eiji Murakami, Hitoshi Higurashi, Toshio Yamaguchi, Souji Koikari +2 more | 2001-11-20 |
| 6313476 | Charged beam lithography system | Mitsuko Shimizu, Takayuki Abe, Hirohito Anze, Susumu Oogi, Takashi Kamikubo +4 more | 2001-11-06 |
| 6182369 | Pattern forming apparatus | Ryoichi Hirano, Shusuke Yoshitake, Toru Tojo | 2001-02-06 |
| 5912468 | Charged particle beam exposure system | Ryoichi Hirano, Souji Koikari, Shusuke Yoshitake, Toru Tojo | 1999-06-15 |
| 5894057 | Charged beam drawing method | Toshio Yamaguchi, Shuichi Tamamushi, Souji Koikari, Eiji Murakami, Shigehiro Hara | 1999-04-13 |
| 5760410 | Electron beam lithography apparatus and method | Shuichi Tamamushi, Toshio Yamaguchi, Ryoichi Yoshikawa | 1998-06-02 |