Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9734981 | Charged particle beam writing apparatus and charged particle beam writing method | Saori Gomi | 2017-08-15 |
| 8280632 | Apparatus and method for inspecting overlapping figure, and charged particle beam writing apparatus | Shinji Sakamoto, Shigehiro Hara | 2012-10-02 |
| 8207514 | Charged particle beam drawing apparatus and proximity effect correction method thereof | Shigehiro Hara, Shuichi Tamamushi, Takashi Kamikubo, Shinji Sakamoto, Yusuke Sakai +2 more | 2012-06-26 |
| 8188449 | Charged particle beam drawing method and apparatus | Hayato Shibata, Akihito Anpo, Jun Yashima, Shigehiro Hara, Susumu Oogi | 2012-05-29 |
| 7949966 | Data verification method, charged particle beam writing apparatus, and computer-readable storage medium with program | Akihito Anpo, Jun Kasahara, Shigehiro Hara | 2011-05-24 |
| 7786453 | Charged-particle beam pattern writing method and apparatus with a pipeline process to transfer data | Shinji Sakamoto, Shigehiro Hara | 2010-08-31 |
| 7750324 | Charged particle beam lithography apparatus and charged particle beam lithography method | Susumu Oogi, Akihito Anpo, Toshiro Yamamoto | 2010-07-06 |
| 7698682 | Writing error verification method of pattern writing apparatus and generation apparatus of writing error verification data for pattern writing apparatus | Akihito Anpo, Jun Kasahara, Shigehiro Hara | 2010-04-13 |
| 7592611 | Creation method and conversion method of charged particle beam writing data, and writing method of charged particle beam | Jun Kasahara, Shigehiro Hara, Akihito Anpo | 2009-09-22 |
| 7504645 | Method of forming pattern writing data by using charged particle beam | Akihito Anpo, Shigehiro Hara | 2009-03-17 |
| 6566662 | Charged beam exposure system | Eiji Murakami, Shigehiro Hara | 2003-05-20 |
| 6319642 | Electron beam exposure apparatus | Shigehiro Hara, Eiji Murakami, Toshio Yamaguchi, Kazuto Matsuki, Souji Koikari +2 more | 2001-11-20 |
| 6313476 | Charged beam lithography system | Mitsuko Shimizu, Takayuki Abe, Hirohito Anze, Susumu Oogi, Takashi Kamikubo +4 more | 2001-11-06 |
| 6248508 | Manufacturing a circuit element | Ken Murooka | 2001-06-19 |
| 6047116 | Method for generating exposure data for lithographic apparatus | Eiji Murakami, Shigehiro Hara, Kiyomi Koyama, Takayuki Abe | 2000-04-04 |
| 5679961 | Correlation tunnel device | Akira Toriumi, Fumiko Yamaguchi, Kiyoshi Kawamura, Alfred W. Hübler | 1997-10-21 |
| 5646559 | Single-electron tunnelling logic device | — | 1997-07-08 |