Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7047094 | LSI mask manufacturing system, LSI mask manufacturing method and LSI mask manufacturing program | — | 2006-05-16 |
| 6447355 | Impregnated-type cathode substrate with large particle diameter low porosity region and small particle diameter high porosity region | Eiichirou Uda, Toshiharu Higuchi, Osamu Nakamura, Sadao Matsumoto, Yoshiaki Ouchi +3 more | 2002-09-10 |
| 6304024 | Impregnated-type cathode substrate with large particle diameter low porosity region and small particle diameter high porosity region | Eiichirou Uda, Toshiharu Higuchi, Osamu Nakamura, Sadao Matsumoto, Yoshiaki Ouchi +3 more | 2001-10-16 |
| 6077310 | Optical proximity correction system | Kazuko Yamamoto, Sachiko Miyama, Soichi Inoue | 2000-06-20 |
| 6047116 | Method for generating exposure data for lithographic apparatus | Eiji Murakami, Hitoshi Higurashi, Shigehiro Hara, Takayuki Abe | 2000-04-04 |
| 6034469 | Impregnated type cathode assembly, cathode substrate for use in the assembly, electron gun using the assembly, and electron tube using the cathode assembly | Eiichirou Uda, Toshiharu Higuchi, Osamu Nakamura, Sadao Matsumoto, Yoshiaki Ouchi +3 more | 2000-03-07 |
| 6004701 | Method for designing Levenson photomask | Taiga Uno, Kazuko Yamamoto, Satoshi Tanaka, Sachiko Kobayashi, Koji Hashimoto | 1999-12-21 |
| 5879844 | Optical proximity correction method | Kazuko Yamamoto, Sachiko Miyama, Soichi Inoue | 1999-03-09 |
| 5795683 | Method and a system for designing a photomask for use in manufacture of a semiconductor device | Taiga Uno, Kazuko Yamamoto | 1998-08-18 |
| 5761075 | Apparatus for designing photomasks | Kazuko Oi | 1998-06-02 |
| 5541025 | Method and apparatus for designing photomasks | Kazuko Oi | 1996-07-30 |
| 5538815 | Method for designing phase-shifting masks with automatization capability | Kazuko Oi, Shigehiro Hara, Koji Hashimoto, Shinichi Ito, Katsuya Okumura | 1996-07-23 |
| 4914304 | Charged-beam exposure system | — | 1990-04-03 |
| 4538232 | Electron-beam lithographic apparatus | — | 1985-08-27 |
| 4531191 | Electron beam pattern generation system | — | 1985-07-23 |