Issued Patents All Time
Showing 1–25 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12148140 | Process condition estimating apparatus, method, and program | Akio Ishikawa | 2024-11-19 |
| 10497534 | Aperture system of electron beam apparatus, electron beam exposure apparatus, and electron beam exposure apparatus system | Hyun Ho Lee, Jong Mun Park, Byoung-Sup Ahn, Jin Choi | 2019-12-03 |
| 10012900 | Method of correcting mask pattern and method of manufacturing reticle | Jong Su Kim, In-Kyun Shin, Sung Il Lee, Jin Choi | 2018-07-03 |
| 9709893 | Exposure method using electron beam and substrate manufacturing method using the same | Sook Hyun Lee, So-eun Shin, Inkyun SHIN, Jin Choi | 2017-07-18 |
| 9583305 | Exposure method using control of settling times and methods of manufacturing integrated circuit devices by using the same | Yong Seok Jung, In-Hwan Noh, In-Kyun Shin, Sang-Hee Lee, Jin Choi | 2017-02-28 |
| 9406117 | Inspection system and method for inspecting line width and/or positional errors of a pattern | Takanao Touya, Hidenori Sato, Hiroyuki Tanizaki, Takeshi Fujiwara, Eiji Sawa +4 more | 2016-08-02 |
| 9343266 | Charged particle beam pattern writing method and charged particle beam writing apparatus that corrects beam rotation utilizing a correlation table | Munehiro Ogasawara, Takanao Touya | 2016-05-17 |
| 9036896 | Inspection system and method for inspecting line width and/or positional errors of a pattern | Takanao Touya, Hidenori Sato, Hiroyuki Tanizaki, Takeshi Fujiwara, Eiji Sawa +4 more | 2015-05-19 |
| 8927941 | Multi charged particle beam writing apparatus and multi charged particle beam writing method with fixed voltage ratio einzel lens | Takanao Touya, Munehiro Ogasawara | 2015-01-06 |
| 8452074 | Apparatus and method for pattern inspection | — | 2013-05-28 |
| 8306310 | Apparatus and method for pattern inspection | — | 2012-11-06 |
| 8277603 | Move mechanism for moving target object and charged particle beam writing apparatus | Shuichiro Fukutome | 2012-10-02 |
| 8229207 | Mask inspection apparatus and mask inspection method | — | 2012-07-24 |
| 8207514 | Charged particle beam drawing apparatus and proximity effect correction method thereof | Shigehiro Hara, Takashi Kamikubo, Hitoshi Higurashi, Shinji Sakamoto, Yusuke Sakai +2 more | 2012-06-26 |
| 8183544 | Correcting substrate for charged particle beam lithography apparatus | Kaoru Tsuruta, Takashi Kamikubo, Rieko Nishimura, Shusuke Yoshitake | 2012-05-22 |
| 7834333 | Charged particle beam lithography system and method for evaluating the same | Rieko Nishimura | 2010-11-16 |
| 7800084 | System and method for charged-particle beam lithography | — | 2010-09-21 |
| 7679068 | Method of calculating deflection aberration correcting voltage and charged particle beam writing method | Takashi Kamikubo, Hitoshi Sunaoshi, Kenji Ohtoshi, Rieko Nishimura | 2010-03-16 |
| 7643130 | Position measuring apparatus and positional deviation measuring method | Shusuke Yoshitake | 2010-01-05 |
| 7554107 | Writing method and writing apparatus of charged particle beam, positional deviation measuring method, and position measuring apparatus | Shusuke Yoshitake | 2009-06-30 |
| 7485879 | Electron beam writing apparatus and writing method | Hitoshi Sunaoshi | 2009-02-03 |
| 6319642 | Electron beam exposure apparatus | Shigehiro Hara, Eiji Murakami, Hitoshi Higurashi, Toshio Yamaguchi, Kazuto Matsuki +2 more | 2001-11-20 |
| 5894057 | Charged beam drawing method | Toshio Yamaguchi, Kazuto Matsuki, Souji Koikari, Eiji Murakami, Shigehiro Hara | 1999-04-13 |
| 5885747 | Charged beam lithography method | Satoshi Yamasaki, Hirohito Anze | 1999-03-23 |
| 5850083 | Charged particle beam lithograph apparatus | Souji Koikari, Shusuke Yoshitake, Munehiro Ogasawara | 1998-12-15 |