| 11901156 |
Multi-charged-particle-beam writing apparatus and multi-charged-particle-beam writing method |
Ryosuke Ueba, Satoru Hirose, Shunsuke ISAJI |
2024-02-13 |
| 11211227 |
Multi charged particle beam evaluation method and multi charged particle beam writing device |
— |
2021-12-28 |
| 10755893 |
Charged particle beam writing method and charged particle beam writing apparatus |
Takahito Nakayama |
2020-08-25 |
| 10622186 |
Charged particle beam writing apparatus and charged particle beam writing method |
Takuya Uemura, Takashi Nakamura, Hideki Matsui, Munehiro Ogasawara, Tatsuya MUROFUSHI +1 more |
2020-04-14 |
| 10586682 |
Method of obtaining beam deflection shape and method of obtaining arrangement angle of blanking aperture array plate |
Shunsuke ISAJI |
2020-03-10 |
| 10483082 |
Evaluation method, correction method, recording medium and electron beam lithography system |
— |
2019-11-19 |
| 10468232 |
Charged particle beam writing apparatus and charged particle beam writing method |
Satoru Hirose, Ryosuke Ueba |
2019-11-05 |
| 10345724 |
Position correction method of stage mechanism and charged particle beam lithography apparatus |
Hidekazu Takekoshi |
2019-07-09 |
| 10283314 |
Charged particle beam writing apparatus, and charged particle beam writing method |
— |
2019-05-07 |
| 9997329 |
Evaluation method, correction method, recording medium and electron beam lithography system |
— |
2018-06-12 |
| 9659746 |
Adjustment method for charged particle beam drawing apparatus and charged particle beam drawing method |
Takashi Nakamura |
2017-05-23 |
| 9147553 |
Method for acquiring settling time |
— |
2015-09-29 |
| 8872139 |
Settling time acquisition method |
Michihiro Sakai |
2014-10-28 |
| 8803108 |
Method for acquiring settling time |
— |
2014-08-12 |
| 8779379 |
Acquisition method of charged particle beam deflection shape error and charged particle beam writing method |
— |
2014-07-15 |
| 8748064 |
Charged particle beam drawing method and charged particle beam drawing apparatus |
Satoshi Nakahashi |
2014-06-10 |
| 8183544 |
Correcting substrate for charged particle beam lithography apparatus |
Kaoru Tsuruta, Takashi Kamikubo, Shusuke Yoshitake, Shuichi Tamamushi |
2012-05-22 |
| 7893411 |
Charged-particle beam writing apparatus and charged-particle beam writing method |
Kiyoshi Hattori |
2011-02-22 |
| 7834333 |
Charged particle beam lithography system and method for evaluating the same |
Shuichi Tamamushi |
2010-11-16 |
| 7777205 |
Electron beam lithography system |
— |
2010-08-17 |
| 7705322 |
Charged-particle beam writing method |
Takashi Kamikubo |
2010-04-27 |
| 7679068 |
Method of calculating deflection aberration correcting voltage and charged particle beam writing method |
Takashi Kamikubo, Shuichi Tamamushi, Hitoshi Sunaoshi, Kenji Ohtoshi |
2010-03-16 |