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Method of measuring beam position of multi charged particle beam, and multi charged particle beam writing apparatus |
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Rotation angle measuring method of multi-charged particle beam image, rotation angle adjustment method of multi-charged particle beam image, and multi-charged particle beam writing apparatus |
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Charged particle beam writing apparatus, and charged particle beam writing method |
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Method of acquiring offset deflection amount for shaped beam and lithography apparatus |
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Method of calculating deflection aberration correcting voltage and charged particle beam writing method |
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Deflector for equipment of electron beam lithography and equipment of electron beam lithography |
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Charged beam applying apparatus |
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Charged beam apparatus having cleaning function and method of cleaning charged beam apparatus |
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