Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8653487 | Lithography apparatus and lithography method | — | 2014-02-18 |
| 8367276 | Mask blank and method of manufacturing mask | Yasushi Okubo, Masahiro Hashimoto, Toshiyuki Suzuki, Takayuki Ohnishi, Hirohito Anze +1 more | 2013-02-05 |
| 8188443 | Focusing method of charged particle beam and astigmatism adjusting method of charged particle | Kenji Ohtoshi, Osamu Iizuka, Takahito Nakayama | 2012-05-29 |
| 7977654 | Writing apparatus and writing method | — | 2011-07-12 |
| 7923704 | Charged particle beam writing method | — | 2011-04-12 |
| 7679068 | Method of calculating deflection aberration correcting voltage and charged particle beam writing method | Takashi Kamikubo, Shuichi Tamamushi, Kenji Ohtoshi, Rieko Nishimura | 2010-03-16 |
| 7652271 | Charged-particle beam lithography with grid matching for correction of beam shot position deviation | Seiji Wake | 2010-01-26 |
| 7485879 | Electron beam writing apparatus and writing method | Shuichi Tamamushi | 2009-02-03 |
| 6836319 | Optical system adjusting method for energy beam apparatus | Munehiro Ogasawara, Jun Takamatsu, Naoharu Shimomura | 2004-12-28 |
| 6781680 | Optical system adjusting method for energy beam apparatus | Munehiro Ogasawara, Jun Takamatsu, Naoharu Shimomura | 2004-08-24 |
| 6617592 | Charged particle beam system and chamber of charged particle beam system | Jun Takamatsu, Kiyoshi Hattori, Naoharu Shimomura, Kiminobu Akeno, Munehiro Ogasawara | 2003-09-09 |
| 6606149 | Optical system adjusting method for energy beam apparatus | Munehiro Ogasawara, Jun Takamatsu, Naoharu Shimomaura | 2003-08-12 |
| 6028317 | Charged particle beam optical element charged particle beam exposure apparatus and method of adjusting the same | Ken Murooka, Munehiro Ogasawara | 2000-02-22 |
| 5843603 | Method of evaluating shaped beam of charged beam writer and method of forming pattern | Atsushi Ando, Hirotsugu Wada, Kazuyoshi Sugihara | 1998-12-01 |