Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10699877 | Charged-particle beam writing apparatus and charged-particle beam writing method | Haruyuki NOMURA | 2020-06-30 |
| 9343323 | Method of producing aperture member | — | 2016-05-17 |
| 9159535 | Multi charged particle beam writing method, and multi charged particle beam writing apparatus | — | 2015-10-13 |
| 8859997 | Charged particle beam writing apparatus and charged particle beam writing method | — | 2014-10-14 |
| 8835881 | Drift correction method and pattern writing data generation method | — | 2014-09-16 |
| 8367276 | Mask blank and method of manufacturing mask | Yasushi Okubo, Masahiro Hashimoto, Toshiyuki Suzuki, Takayuki Ohnishi, Hirohito Anze +1 more | 2013-02-05 |
| 8301291 | Charged particle beam writing apparatus, write data creation method and charged particle beam writing method | — | 2012-10-30 |
| 8207514 | Charged particle beam drawing apparatus and proximity effect correction method thereof | Shigehiro Hara, Shuichi Tamamushi, Hitoshi Higurashi, Shinji Sakamoto, Yusuke Sakai +2 more | 2012-06-26 |
| 8183544 | Correcting substrate for charged particle beam lithography apparatus | Kaoru Tsuruta, Rieko Nishimura, Shusuke Yoshitake, Shuichi Tamamushi | 2012-05-22 |
| 7705322 | Charged-particle beam writing method | Rieko Nishimura | 2010-04-27 |
| 7679068 | Method of calculating deflection aberration correcting voltage and charged particle beam writing method | Shuichi Tamamushi, Hitoshi Sunaoshi, Kenji Ohtoshi, Rieko Nishimura | 2010-03-16 |
| 7495243 | Writing method of charged particle beam, support apparatus of charged particle beam writing apparatus, writing data generating method and program-recorded readable recording medium | — | 2009-02-24 |
| 7083674 | Pigment dispersant, and pigment composition, pigment dispersion and printing ink using the same | Tetsuya Sai | 2006-08-01 |
| 7077899 | Pigment dispersing agent, pigment composition containing the same and pigment dispersion containing the same | Daisuke Tanabe, Tetsuya Sai | 2006-07-18 |
| 6346354 | Pattern writing method | Takayuki Abe, Hirohito Anze, Susumu Oogi, Mitsuko Shimizu, Hideo Inoue +5 more | 2002-02-12 |
| 6313476 | Charged beam lithography system | Mitsuko Shimizu, Takayuki Abe, Hirohito Anze, Susumu Oogi, Eiji Murakami +4 more | 2001-11-06 |
| 6123763 | Pigment dispersing agent and pigment composition containing the same | Yuuji Hirasawa, Toru Omura | 2000-09-26 |
| 5863682 | Charged particle beam writing method for determining optimal exposure dose prior to pattern drawing | Takayuki Abe, Susumu Oogi, Hirohito Anze | 1999-01-26 |
| 5854323 | Pigment dispersing agent, composition containing the same, and aqueous pigment dispersion | Tadashi Itabashi, Katsuhiko Sawamura | 1998-12-29 |
| 5698618 | Coating composition | Tadashi Itabashi, Masami Kuwahara | 1997-12-16 |