Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9217918 | Photomask, photomask manufacturing apparatus, and photomask manufacturing method | — | 2015-12-22 |
| 8883373 | Method for manufacturing photo mask, method for manufacturing semiconductor device, and program | Akiko Mimotogi, Tetsuro Nakasugi | 2014-11-11 |
| 8728711 | Cleaning reticle, method for cleaning reticle stage, and method for manufacturing semiconductor device | Yumi Nakajima, Ryoichi Inanami | 2014-05-20 |
| 8285412 | Semiconductor device production control method | — | 2012-10-09 |
| 8234596 | Pattern data creating method, pattern data creating program, and semiconductor device manufacturing method | Ryuji Ogawa, Masahiro Miyairi, Shimon Maeda, Satoshi Tanaka | 2012-07-31 |
| 8230379 | Layout generating method for semiconductor integrated circuits | Sachiko Kobayashi | 2012-07-24 |
| 8227151 | Flare correction method, method for manufacturing mask for lithography, and method for manufacturing semiconductor device | Ryoichi Inanami | 2012-07-24 |
| 8118585 | Pattern formation method and a method for manufacturing a semiconductor device | Masayuki Hatano, Tetsuro Nakasugi | 2012-02-21 |
| 7966584 | Pattern-producing method for semiconductor device | Toshiya Kotani, Soichi Inoue | 2011-06-21 |
| 7917871 | Method and program for pattern data generation using a modification guide | Sachiko Kobayashi, Shimon Maeda | 2011-03-29 |
| 7797068 | Defect probability calculating method and semiconductor device manufacturing method | — | 2010-09-14 |
| 7673258 | Design data creating method, design data creating program product, and manufacturing method of semiconductor device | — | 2010-03-02 |
| 7539962 | Pattern data correcting method, photo mask manufacturing method, semiconductor device manufacturing method, program and semiconductor device | — | 2009-05-26 |
| 7523437 | Pattern-producing method for semiconductor device | Toshiya Kotani, Soichi Inoue | 2009-04-21 |
| 7499582 | Method for inspecting a defect in a photomask, method for manufacturing a semiconductor device and method for producing a photomask | Toshiya Kotani, Shinji Yamaguchi, Soichi Inoue | 2009-03-03 |
| 7266801 | Design pattern correction method and mask pattern producing method | Toshiya Kotani, Hirotaka Ichikawa | 2007-09-04 |
| 7194704 | Design layout preparing method | Toshiya Kotani, Shigeki Nojima, Kyoko Izuha, Ryuji Ogawa, Satoshi Tanaka +2 more | 2007-03-20 |
| 7029799 | Exposure method for forming pattern for IC chips on reticle by use of master masks | Soichi Inoue | 2006-04-18 |
| 6635549 | Method of producing exposure mask | Iwao Higashikawa | 2003-10-21 |
| 6542237 | Exposure method for making precision patterns on a substrate | Iwao Higashikawa, Soichi Inoue | 2003-04-01 |
| 6340542 | Method of manufacturing a semiconductor device, method of manufacturing a photomask, and a master mask | Soichi Inoue, Iwao Higashikawa, Ichiro Mori | 2002-01-22 |
| 6319637 | Method for forming pattern | Iwao Higashikawa | 2001-11-20 |