Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10782621 | Imprint method, imprint apparatus, and template | Mitsuko Shimizu, Takashi Sato, Akiko Yamada, Takeshi Suto | 2020-09-22 |
| 10022748 | Stencil mask, stencil mask manufacturing method, and imprinting method | Masato Suzuki, Yohko Komatsu, Ryoichi Suzuki, Kazuya Fukuhara | 2018-07-17 |
| 9957630 | Pattern transfer mold and pattern formation method | Yongfang Li, Ryoichi Inanami, Takashi Sato, Masato Saito, Koichi Kokubun | 2018-05-01 |
| 8883373 | Method for manufacturing photo mask, method for manufacturing semiconductor device, and program | Suigen Kyoh, Tetsuro Nakasugi | 2014-11-11 |
| 8438527 | Original plate evaluation method, computer readable storage medium, and original plate manufacturing method | Satomi Nakamura, Toshiya Kotani, Kazuhito Kobayashi, Chikaaki Kodama | 2013-05-07 |
| 8230369 | Simulation method and simulation program | Satoshi Tanaka, Shoji Mimotogi, Takashi Sato | 2012-07-24 |
| 8122385 | Mask pattern correcting method | Kazuya Fukuhara, Tatsuhiko Higashiki, Toshiya Kotani, Satoshi Tanaka, Takashi Sato +1 more | 2012-02-21 |
| 8081294 | Method of evaluating optical beam source of exposure device, method of designing illumination shape of exposure device, and software for optimizing illumination shape of exposure device | — | 2011-12-20 |
| 7985517 | Lithography simulation method, computer program product, and pattern forming method | Satoshi Tanaka | 2011-07-26 |
| 7459264 | Device manufacturing method | Daisuke Kawamura, Takashi Sato | 2008-12-02 |
| 6252651 | Exposure method and exposure apparatus using it | Tadahito Fujisawa, Satoshi Tanaka, Shoji Mimotogi, Soichi Inoue | 2001-06-26 |
| 6107013 | Exposure method and exposure apparatus using it | Tadahito Fujisawa, Satoshi Tanaka, Shoji Mimotogi, Soichi Inoue | 2000-08-22 |
| 6045981 | Method of manufacturing semiconductor device | Kentaro Matsunaga, Shoji Mimotogi, Soichi Inoue | 2000-04-04 |
| 5876885 | Profile simulation method, dependent on curvature of processed surface, and mask design method utilizing simulation | Shoji Mimotogi, Soichi Inoue | 1999-03-02 |