Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10852648 | Mask pattern correction system, and semiconductor device manufacturing method utilizing said correction system | Kazuyuki Hino, Hiromitsu Mashita, Hiroshi Yoshimura, Taiga Uno, Sachiyo Ito +4 more | 2020-12-01 |
| 10151972 | Manufacturing method of photomask and recording medium | Takaki Hashimoto, Satoshi Usui, Naoki Sato, Kouichi Nakayama, Syogo Okamoto | 2018-12-11 |
| 9268208 | Pattern generating method, pattern forming method, and pattern generating program | Ryota Aburada, Hiromitsu Mashita, Taiga Uno, Toshiya Kotani | 2016-02-23 |
| 8336004 | Dimension assurance of mask using plurality of types of pattern ambient environment | Shigeki Nojima, Tetsuaki Matsunawa, Shigeru Hasebe | 2012-12-18 |
| 8261214 | Pattern layout creation method, program product, and semiconductor device manufacturing method | Shimon Maeda, Soichi Inoue | 2012-09-04 |
| 8234596 | Pattern data creating method, pattern data creating program, and semiconductor device manufacturing method | Ryuji Ogawa, Shimon Maeda, Suigen Kyoh, Satoshi Tanaka | 2012-07-31 |