Issued Patents All Time
Showing 1–25 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6806941 | Pattern forming method and pattern forming apparatus | Soichi Inoue, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto | 2004-10-19 |
| 6765673 | Pattern forming method and light exposure apparatus | — | 2004-07-20 |
| 6680462 | Heat treating method and heat treating apparatus | Hideaki Sakurai, Shinichi Ito, Akitoshi Kumagae | 2004-01-20 |
| 6635549 | Method of producing exposure mask | Suigen Kyoh | 2003-10-21 |
| 6542237 | Exposure method for making precision patterns on a substrate | Suigen Kyoh, Soichi Inoue | 2003-04-01 |
| 6495807 | Heat treating method and heat treating apparatus | Hideaki Sakurai, Shinichi Ito, Akitoshi Kumagae | 2002-12-17 |
| 6483083 | Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surface | Hideaki Sakurai, Akitoshi Kumagae, Shinichi Ito, Tsunetoshi Arikado, Katsuya Okumura | 2002-11-19 |
| 6340542 | Method of manufacturing a semiconductor device, method of manufacturing a photomask, and a master mask | Soichi Inoue, Suigen Kyoh, Ichiro Mori | 2002-01-22 |
| 6335145 | Pattern forming method and pattern forming apparatus | Soichi Inoue, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto | 2002-01-01 |
| 6333138 | Exposure method utilizing partial exposure stitch area | Takayuki Abe | 2001-12-25 |
| 6333493 | Heat treating method and heat treating apparatus | Hideaki Sakurai, Shinichi Ito, Akitoshi Kumagae | 2001-12-25 |
| 6319637 | Method for forming pattern | Suigen Kyoh | 2001-11-20 |
| 6265696 | Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surface | Hideaki Sakurai, Akitoshi Kumagae, Shinichi Ito, Tsunetoshi Arikado, Katsuya Okumura | 2001-07-24 |
| 6165652 | Pattern forming method and pattern forming apparatus | Soichi Inoue, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto | 2000-12-26 |
| 6040114 | Pattern forming method | Soichi Inoue, Yoji Ogawa, Shigehiro Hara, Kazuko Yamamoto | 2000-03-21 |
| 5969428 | Alignment mark, manufacturing method thereof, exposing method using the alignment mark, semiconductor device manufactured using the exposing method | Hiroshi Nomura, Akitoshi Kumagae | 1999-10-19 |
| 5907393 | Exposure mask and method and apparatus for manufacturing the same | Kenji Kawano, Shinichi Ito, Masamitsu Itoh, Takashi Kamo, Hiroaki Hazama +1 more | 1999-05-25 |
| 5851842 | Measurement system and measurement method | Ryota Katsumata, Nobuo Hayasaka, Naoki Yasuda, Hideshi Miyajima, Masaki Hotta | 1998-12-22 |
| 5847468 | Alignment mark for use in making semiconductor devices | Hiroshi Nomura, Akitoshi Kumagae | 1998-12-08 |
| 5767521 | Electron-beam lithography system and method for drawing nanometer-order pattern | Shiro Takeno, Shigeru Kanbayashi, Mitsuo Koike, Seizo Doi | 1998-06-16 |
| 5728494 | Exposure mask and method and apparatus for manufacturing the same | Kenji Kawano, Shinichi Ito, Masamitsu Itoh, Takashi Kamo, Hiroaki Hazama +1 more | 1998-03-17 |
| 5629115 | Exposure mask and method and apparatus for manufacturing the same | Kenji Kawano, Shinichi Ito, Masamitsu Itoh, Takashi Kamo, Hiroaki Hazama +1 more | 1997-05-13 |
| 5374502 | Resist patterns and method of forming resist patterns | Toshihiko Tanaka, Mitsuaki Morigami, Takeo Watanabe | 1994-12-20 |
| 5326672 | Resist patterns and method of forming resist patterns | Toshihiko Tanaka, Mitsuaki Morigami, Takeo Watanabe | 1994-07-05 |
| 5262282 | Pattern forming method | Katsuhiko Hieda | 1993-11-16 |