Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6680462 | Heat treating method and heat treating apparatus | Hideaki Sakurai, Shinichi Ito, Iwao Higashikawa | 2004-01-20 |
| 6495807 | Heat treating method and heat treating apparatus | Hideaki Sakurai, Shinichi Ito, Iwao Higashikawa | 2002-12-17 |
| 6483083 | Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surface | Hideaki Sakurai, Iwao Higashikawa, Shinichi Ito, Tsunetoshi Arikado, Katsuya Okumura | 2002-11-19 |
| 6333493 | Heat treating method and heat treating apparatus | Hideaki Sakurai, Shinichi Ito, Iwao Higashikawa | 2001-12-25 |
| 6265696 | Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surface | Hideaki Sakurai, Iwao Higashikawa, Shinichi Ito, Tsunetoshi Arikado, Katsuya Okumura | 2001-07-24 |
| 5969428 | Alignment mark, manufacturing method thereof, exposing method using the alignment mark, semiconductor device manufactured using the exposing method | Hiroshi Nomura, Iwao Higashikawa | 1999-10-19 |
| 5847468 | Alignment mark for use in making semiconductor devices | Hiroshi Nomura, Iwao Higashikawa | 1998-12-08 |
| RE35821 | Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer | Hirokazu Niki, Rumiko Hayase, Naohiko Oyasato, Yasunobu Onishi, Kazuo Sato +2 more | 1998-06-09 |
| 5326675 | Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer | Hirokazu Niki, Rumiko Hayase, Naohiko Oyasato, Yasunobu Onishi, Kazuo Sato +2 more | 1994-07-05 |
| 5169740 | Positive type and negative type ionization irradiation sensitive and/or deep U.V. sensitive resists comprising a halogenated resin binder | Toru Ushirogouchi, Tsukasa Tada | 1992-12-08 |